The pain of high-end Kirin will end by the end of 2024.
Chinese semiconductor industry
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The pain of high-end Kirin will end by the end of 2024.
What exactly did it say? The recording of the presentation is a bit too small to see clearly. At least on my crappy device that is.
actually i don't know Chinese. so waiting for someone to translate. LOOL
Grating tool tip angle measuring device and measuring method
Abstract
The invention provides a grating cutter tool tip angle measuring device and a measuring method, wherein the measuring device comprises a base plate; a tool holder adjusting mechanism fixed on one side of the base plate is used to adjust and fix the position of the grating cutter; The light source on the same side as the tool holder adjustment mechanism is used to emit a measuring beam to the grating tool; the optical signal receiving system connected to the base plate in rotation is used to receive the reflected light from the directional surface and non-directional surface of the grating tool in a rotating manner; fixed The circular grating measurement system on the other side of the substrate is used to measure the angular displacement θ of the optical signal receiving system from receiving the reflected light of the directional surface to receiving the reflected light of the non-directional surface, then the tool nose angle of the grating tool is The invention can directly measure the cutting edge angle of the grating cutter, improve the measuring accuracy of the cutting edge angle, ensure the extrusion effect of the grating cutter on the aluminum film, and improve the production efficiency of the large-sized echelle grating.CN114608483A
Application filed by Beijing Rslaser Opto Electronics Technology Co ltd, Changchun Institute of Optics Fine Mechanics and Physics of CASDescription
Grating tool tip angle measuring device and measuring method technical field The invention relates to the technical field of grating scribing, in particular to a grating tool tip angle measuring device and a measuring method. Background technique Echelle gratings, which are produced by mechanical scribing, are used in the field of lithography due to their advantages in diffraction efficiency, resolution and use of wavelength bands. They are the core unit devices of immersion lithography light sources for high-end lithography machines. Since the complex grooves carved by the echelle grating are formed by extruding and polishing the aluminum film with a grating tool, the quality of the grating grooves directly affects the diffraction efficiency and stray light intensity of the echelle grating.
This one can be used in measurement equipment.
Optical path structure and spectrometer of immersion echelle spectrometer
Abstract
The invention relates to the technical field of imaging spectrometers, and in particular provides an optical path structure of an immersed echelle grating spectrometer and a spectrometer. The optical path structure includes an incident slit, a collimation system, a primary dispersion system, a secondary dispersion system, a focusing system and a detection system. The detected substance enters the incident slit, and the generated incident beam is incident on the collimation system, and after being collimated by the collimation system, it becomes a parallel beam; the parallel beam passes through the primary dispersion system. The first dispersion is carried out through the secondary dispersion system for the second dispersion to obtain a two-dimensional spectrum; the two-dimensional spectrum is imaged to the detector after being focused by the focusing system. The optical path structure and spectrometer provided by the invention not only greatly improve the efficiency and spectral resolution of the optical system, but also make the spectrometer more compact in space, and at the same time, for the refrigeration type infrared spectrometer, the stability of the system is improved.CN114608704A
Changchun Institute of Optics Fine Mechanics and Physics of CAS
Huawei fan made about Mate 40 with Kirin 9000, Fan wants Kirin back, they wants to hear "big mouth" say Kirin xxx... in the Mate 50 release conference... he didn't mention the chip on the line mate 50... this pain will end in 2023, but High end Kirin will release in 2024
any idea what they will be producing from now until end of 2023? If Huawei/Hisilicon is able to produce 14 nm chips with a de-americanized line, shouldn't they be producing chips this year? Are they start off with server and AI chips?
Looks like the 2023 rumors about Huawei return several months ago is starting to shape up. 2023 seems like it will be an interesting if not pivot year for China’s domestic semi industry. Probably a huge ratching of tensions from the US as well.
Biren Emerges from Stealth with GPGPU Offering
By Sally Ward-Foxton 08.26.2022At Hot Chips, Chinese startup Biren has emerged from stealth, detailing a large, general-purpose GPU (GPGPU) chip intended for AI training and inference in the data center. The BR100 is composed of two identical compute chiplets, built on TSMC 7 nm at 537 mm2 each, plus four stacks of HBM2e in a CoWoS package.
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The BR100 can achieve 2 POPS of INT8 performance, 1 PFLOPS of BF16, or 256 TFLOPS of FP32. This is doubled to 512 TFLOPS of 32-bit performance when using Biren’s new TF32+ number format. The GPU also supports other 16- and 32-bit formats but not 64-bit (64-bit is not widely used for AI workloads outside of scientific computing).
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As well as its GPU architecture, Biren has also developed a dedicated 412-GB/s chip-to-chip (BR100 to BR100) interconnect called BLink, with eight BLink ports per chip. This is used to connect to other BR100s in a server node.
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