This is why ASML CEO "Supply Chain" Wennink is so concerned about this IP theft, and I've written about it in several articles. The IP is now in China. ASML spend $850 billion in R&D on this software IP over 10 years. China got it in 1 day for $0. This suggests Chinese lithography companies will soon catch up to ASML, provided some of the last remaining issues such as the wafer stage for better overlay are resolved.
850 billion looks like a lot money for a piece of code. Do that price include some kind of special hardware? Because spending 380% of the company revenue in a piece of code that is mostly autogenerated may sound like rip off.
850
million in ten years sounds like a more reasonable figure.
In other note the suppose IP is more related to metrology especially with their YieldStar system and their OPC software for masks, especially with DUV. None of those will help (SMEE, CHEERTECH, U-Precision, CNEPO, RSLaser) to replicate the level of ASML scanners in a easy way, those scanners are compose of many highly precise and complex subsystems, that are difficult to replicate just by looking it. Hard research and work is still the only way out.