SMEE will produce 20 duv this year according to plan.Nand and memory definitely need sub 28nm immersion lithography. Maybe do not (immediately) need EUV, but this is a different thing.
SMEE will produce 20 duv this year according to plan.Nand and memory definitely need sub 28nm immersion lithography. Maybe do not (immediately) need EUV, but this is a different thing.
So essentially is the view that banning AMAT, LAM doesn't actually restrict YTMC as the real core component for beyond 128nm are lithography devices?This is a free gift to AMEC
US is acting as if they still have monopoly on equipment. Of course AMAT and Lam research are still leaders in their market....but no more in a monopoly situation. Only the banning of ASML would be effective nowadays.
Although also ASML has been and is subject to huge US pressure, the simple fact that it is not a US company, nevertheless makes the things much more difficult for US administration, and has proven a good thing for China.
This is only speculation on my side, but my opinon is that if ASML would have been an american company, now things would have been much much worse.
@huemens Bro again China is not the Target, its TSMC and Samsung! the dithering is for show, you know how the American operates, they will kill you if given the opportunity. Most of those National security folks don't know anything about Semiconductors, for them being on top is what matters and IF they can't have it then harvest it.My be they were waiting for the chips act to pass. Now they can give a piece of that to these equipment companies while they cut down on sale to China. Now they are just straight up banning without even saying National Security or anything. This is a golden opportunity for Chinese equipment makers to ramp up production.
You need machine with special characteristics. But still easier than EUV.So essentially is the view that banning AMAT, LAM doesn't actually restrict YTMC as the real core component for beyond 128nm are lithography devices?
@PopularScience bro count me as a skeptic BUT want to be proven wrong, 20 maybe for next year, 8 to 12 is more believable this year.SMEE will produce 20 duv this year according to plan.
Both dry and immersion.@PopularScience bro count me as a skeptic BUT want to be proven wrong, 20 maybe for next year, 8 to 12 is more believable this year.
@european_guy and here bro I applauded ASML, they push back and push back HARD! I think the status quo holds and the ban on EUVL sales is still on until 2026 when the Chinese introduce their own.This is a free gift to AMEC
US is acting as if they still have monopoly on equipment. Of course AMAT and Lam research are still leaders in their market....but no more in a monopoly situation. Only the banning of ASML would be effective nowadays.
Although also ASML has been and is subject to huge US pressure, the simple fact that it is not a US company, nevertheless makes the things much more difficult for US administration, and has proven a good thing for China.
This is only speculation on my side, but my opinon is that if ASML would have been an american company, now things would have been much much worse.
The whole optics set need to be redesigned to accommodate a immersion hood and immersion fluid fittings.It’s a whole lot more than that. ArFi requires a whole set of fluidics control systems too, and you need to pair the solid state optics with the immersion liquid’s optical properties so you’re not even using the same optical design. These are not compatible machines.
So essentially is the view that banning AMAT, LAM doesn't actually restrict YTMC as the real core component for beyond 128nm are lithography devices?