A sub-system provider of SMEE and probably other lithography companies in China depending on the type of system.
Technical indicators
performance
This product requires extremely high image quality uniformity within the field of view, which depends on the performance of the microscope objective. In order to achieve uniform performance in a large field of view, Maolai has optimized the design and process, so that the performance of the microscope objective ensures that the difference between the performance of the edge field of view and the central field of view is less than 15%, and within a certain depth of focus range. Satisfied inside. Maurai is developing next-generation microscope objective lenses in response to customer needs, with both NA and field of view larger than current products by more than 20%.
OPTICAL LENS OF LITHOGRAPHY MACHINE/SEMICONDUCTOR LITHOGRAPHY MACHINE AND INSPECTION
Core optical devices for lithography machines: There are more than 1,000 types of optical devices. Currently, hundreds of optical devices have been developed and produced. They have ultra-high smoothness of 20/10, high surface quality of 5/1, and ultra-smooth <1nm. The key device for the engraving machine to achieve light uniformity, realize import substitution, and mass production.
Technical indicators
performance
With the advantages of precision optical processing and strong laser coating technology, Maolai produces semiconductor optical lenses with high surface shape and anti-laser damage threshold, and good film uniformity, reaching the same international level. Maolai's product has achieved large-scale production and has a certain cost advantage.
EUV OPTICS
Extreme Ultra-violet Lithography (EUVL) is a projection lithography technology that uses extreme ultraviolet light with a wavelength of 13.5nm as a light source. In the light source system, the target material is usually bombarded with laser light emitted by a high-energy laser, and the target material will be ionized to generate high-intensity plasma, and at the same time emit extreme ultraviolet light. In this working band, the transmittance of the transmissive material is low, so the EUVL optical system including the illumination system and the projection system needs to adopt a reflective structure. The schematic diagram of its optical system is shown in the following figure:
EMPOWERING SEMICONDUCTOR EQUIPMENT
In the field of semiconductors, Maolai Optics can provide integrated solutions from design, manufacturing, assembly and adjustment, and at the same time provide simulation optimization services under customer application scenarios. There are a full range of semiconductor back-end inspection objective lenses for customers to choose from, and we can provide the design and manufacture of customized objective lenses, tube lenses, lighting, DIC prisms and other accessories according to customer needs.SEMICONDUCTOR INSPECTION MICROSYSTEM/SEMICONDUCTOR DEFECT INSPECTION
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Technical indicators
| Maolai Optics | Microscopic imaging: There are a total of 8 combinations of magnifications, the image quality is clear and uniform, and the FN is 24mm Kohler Lighting: Lighting uniformity above 90% |
performance
This product requires extremely high image quality uniformity within the field of view, which depends on the performance of the microscope objective. In order to achieve uniform performance in a large field of view, Maolai has optimized the design and process, so that the performance of the microscope objective ensures that the difference between the performance of the edge field of view and the central field of view is less than 15%, and within a certain depth of focus range. Satisfied inside. Maurai is developing next-generation microscope objective lenses in response to customer needs, with both NA and field of view larger than current products by more than 20%.
OPTICAL LENS OF LITHOGRAPHY MACHINE/SEMICONDUCTOR LITHOGRAPHY MACHINE AND INSPECTION
Core optical devices for lithography machines: There are more than 1,000 types of optical devices. Currently, hundreds of optical devices have been developed and produced. They have ultra-high smoothness of 20/10, high surface quality of 5/1, and ultra-smooth <1nm. The key device for the engraving machine to achieve light uniformity, realize import substitution, and mass production.
Technical indicators
| Maolai Optics | Surface shape: N<3, △N less than 0.1 Coating reflectivity: R value<0.3%@0° Laser damage threshold: 100W/cm^2 |
performance
With the advantages of precision optical processing and strong laser coating technology, Maolai produces semiconductor optical lenses with high surface shape and anti-laser damage threshold, and good film uniformity, reaching the same international level. Maolai's product has achieved large-scale production and has a certain cost advantage.
EUV OPTICS
Extreme Ultra-violet Lithography (EUVL) is a projection lithography technology that uses extreme ultraviolet light with a wavelength of 13.5nm as a light source. In the light source system, the target material is usually bombarded with laser light emitted by a high-energy laser, and the target material will be ionized to generate high-intensity plasma, and at the same time emit extreme ultraviolet light. In this working band, the transmittance of the transmissive material is low, so the EUVL optical system including the illumination system and the projection system needs to adopt a reflective structure. The schematic diagram of its optical system is shown in the following figure:
