I've always been thinking: How did they decide on 13.5 nm? I mean this seems like a dumb question but really, how was this specific number chosen?
After all, they didn't really know what they were looking for when EUV lithography was being designed.
but up to
So why would they pick this specific wavelength as early as 2001 even though in 2001 the most advanced processes were on 0.13 micron, using KrF lithography, and general processes were on 0.35 micron with i-line mercury lamp lithography???
Indeed, even now the 13.5 nm EUV lithography is neither coherent or monochromatic (the advantages of excimer sources), and only ~3% energy efficient. 13.5 nm has other problems: secondary electron generation and diffusion makes for 'fuzzy' lines that somewhat negate the finer line widths possible, it is absorbed by all materials, it requires reflection only optics, it is best with grazing incidence optics like X-rays, etc.
If I were looking at this from the outside, it wouldn't have been obvious to me that specifically 13.5 nm was a good choice for a wavelength. Indeed, the light source development alone took almost 20 years.
If that's the case, then should a synchrotron source which has a tunable wavelength really stick with 13.5 nm?