Chinese semiconductor industry

huemens said:

A loss to Cymer is still a loss to ASML. Even though Cymer is headquartered in the US, it is a private company 100% owned by ASML. On the other hand KLA, LAM and AMAT are US publicly traded companies. I think the main leverage US has over ASML is the EUV patents currently used by ASML (owned by USG), rather than Cymer operations being based at US.

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Oldschool​

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ansy1968 said:

From our esteem member @Oldschool , Sir I thank you for providing this info and clearing out doubt regarding SMEE SSA800 DUVL.

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I read some chinese forum comments that there is doubt whether the 6kHZ 60W ArF light source being delivered. The 4kHZ 40W ArF was used in the 90nm DUV.
According LeadLeo research center, The 6kHz 60W ArF was delivered which is needed for 28nm DUV.

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WTAN said:

LOL! So we have news that the Arf 60W Light Source was indeed delivered to SMEE for the 28nm DUVL.

That Outfit called EQUAL OCEAN was obviously peddling fake news about how RSLaser was only capable of developing Arf 40W Light Sources and the whole SMEE 28nm DUVL project was not sucessful because of the lack of a 60W Light Source.
Maybe they were paid by the Chinese Govt to release fake new to Westerners to mislead them about the capability of the SMEE DUVL.

But......coming to think of it, the 60W Light Source is just a slight upgrade to the 40W Light Source and RSLaser would not have much problems developing this upgraded Light source if it was required to.

By the way Ansy, Old School mentioned some time ago that Tsinghua Uni or CAS had developed some Light Source Equipment related to SSMB for R&D, what type of Equipment is this? Maybe Old School can give some information?

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ansy1968 said:

@WTAN Sir he read your post and surely he will respond and let you know ASAP. Sir sometimes I posted overenthusiastic statement, a trait I'm trying to overcome ..hehehe BUT for future SMEE DUVL iteration (like 22nm DUVL aka SSA900 ) that can match ASML NXT 2050i , increasing the power source to 90W is the answer?

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ansy1968 said:

@WTAN Sir he read your post and surely he will respond and let you know ASAP. Sir sometimes I posted overenthusiastic statement, a trait I'm trying to overcome ..hehehe BUT for future SMEE DUVL iteration (like 22nm DUVL aka SSA900 ) that can match ASML NXT 2050i , increasing the power source to 90W is the answer?

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WTAN said:

Yes.......increasing the Light Source power to 90W and improving the Overlay Accuracy of the Machine is the key to achieving the ability to produce 5nm ICs.

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ansy1968 said:

@WTAN and Sir doing both are possible in a year? ASML going from 1980i (2015) to 2050i (2019) takes 4years with NXT 2000i in between? so a minimum of 2 years? with China having received a 2050i copy as posted by @foofy can we skip the process and reach the cream of the DUVL crop?

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WTAN said:

If it is true that the 2050i has been delivered to China FABS, then it will speed up the process of SMEE R&D of more advanced DUVL.
SMEE can learn about the operation and capabilities of the latest ASML DUVL.
As mentioned before SMEE is already developing or has already developed a 22nm DUVL.
So we can expect an improved DUVL in probably 2 years or so.

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