Thanks for the great info as always @WTAN.As far as i know, the SMEE 28nm DUVL has been sucessfully developed and is the equivalent of the ASML 1980i. This has been confirmed by an SMEE Insider.
The DUVL is currently undergoing rigorous trials at a test production line and may have already been certified.
SMEE Officials have reportedly said that mass production of the DUVL will begin sometime in mid 2022.
This fits in with the claim recently by the Huawei CEO that Huawei will begin production of its 28nm ICs in 2022.
As far as information from Twitter is concerned, many of these people are not experts in the technical field and they usually copy information from each other. For eg: Chollima Report may get their info from China Semi etc. Dai Wei Wei tweets but does not provide sources. So we have to be careful in reading this info.
In regard to the EUVL, i think there is still no firm decision made on whether LPP or DPP should be used. The Synchrotron Light Source or SSMB is also another option being looked at.
The Chinese Academy of Sciences is now starting to do R&D on the SSMB Light Source. (separately from Tsinghua Uni)
The newly constructed 4th Generation Beijing HEP Synchrotron Facility is the perfect place to do R&D on SSMB for EUVL Lithography.
It is a World leading and Advanced 4th Gen Synchrotron and the CAS will certainly use it to develop the SSMB Light Source.
Will the EUVL be ready in 2023? Might be a bit early and i think more likely by 2025.
In the mean time, SMEE and CETC will develop advanced versions of their DUVL which can produce 5nm ICs.
Just curious on where I can find a source for this piece off info?
This fits in with the claim recently by the Huawei CEO that Huawei will begin production of its 28nm ICs in 2022.
