Is not being sold in the open market for anyone to buy. Is going mainly to sanctioned companies who ASML doesn´t do business anymore. ASML has another things to worry about the Chinese market.This may well be the most important news of the last 2 years.
Because of this I am wondering about the sources: "According to reports" what it means according to reports?
They say "In March 2026, Shanghai Microelectronics publicly showcased the machine for the first time at SEMICON China 2026" but this is not what has been reported in this forum in March, actually the stand of SMEE was showing a mock-up that they present every year and I don't remember of any official announcement at the time: SEMICON China 2026 was covered at length here.
Also overlay tolerance ±2.3~2.5nm is the single most important parameter for a litho machine. It would be important to have an official spec by SMEE in this regards. The article seems to hint that the SSA800 machine is now publicly acknowledged and officially reported by SMEE: so why specs arrive through "reports" ?
Again, I am questioning not to minimize the news, but actually for the opposite reason, because the news if official (currently it is not IMHO) would be the single most important of the last few years: there is a big difference between knowing that the SSA800 exists and it works and its official presentation with official specs by SMEE.
Good enough to meet domestic needs and because the supply chain is domestically controlled prices can be cost down so multiple scanners can be put for the price of one.150wpm is a good start but this has a long way to be improved! Overtime, the gap will shrink
Wafers per hour, not month.150wpm is a good start but this has a long way to be improved! Overtime, the gap will shrink
as per this report they will produce 5-8 units in Q2. it means full year production maybe like 20-30 units which is enough to supply many fabs in mainland.Is not being sold in the open market for anyone to buy. Is going mainly to sanctioned companies who ASML doesn´t do business anymore. ASML has another things to worry about the Chinese market.
well, it's just needed for the most critical layer IIRC?the overlay requirements for 7nm is 2.0nm so is very close.
Where are you getting this? It's in fact likely that SMEE just concentrate on ramping Arf/Arfi scanner production because their WPH rate is likely lower than that of ASML machines. So, they would concentrate on delivering to top end labs.-SMEE ( or whatever they name themselves now) KrF lithography machines are a bigger threat than the Immersion machines because those are being sold outside the sanction regime.
if you read the article. It says the machine being used is already at 90-95% yield. Which is quite significant.This may well be the most important news of the last 2 years.
Because of this I am wondering about the sources: "According to reports" what it means according to reports?
They say "In March 2026, Shanghai Microelectronics publicly showcased the machine for the first time at SEMICON China 2026" but this is not what has been reported in this forum in March, actually the stand of SMEE was showing a mock-up that they present every year and I don't remember of any official announcement at the time: SEMICON China 2026 was covered at length here.
Also overlay tolerance ±2.3~2.5nm is the single most important parameter for a litho machine. It would be important to have an official spec by SMEE in this regards. The article seems to hint that the SSA800 machine is now publicly acknowledged and officially reported by SMEE: so why specs arrive through "reports" ?
Again, I am questioning not to minimize the news, but actually for the opposite reason, because the news if official (currently it is not IMHO) would be the single most important of the last few years: there is a big difference between knowing that the SSA800 exists and it works and its official presentation with official specs by SMEE.
I guess you can compensate with multiple machines? SSA800 is likely less economical than ASML machines to start off. But given the latter might not have maintenance, seems like worth the trade off.150wpm is a good start but this has a long way to be improved! Overtime, the gap will shrink
KrF development is pretty mature right now and it was pretty mature in the 600 series, RSLaser KrF light source was already developed in the 600 series, KrF optics and light sources are way cheaper and easier to make so I don´t think will bog down ArF/ArFi machines production .Where are you getting this? It's in fact likely that SMEE just concentrate on ramping Arf/Arfi scanner production because their WPH rate is likely lower than that of ASML machines. So, they would concentrate on delivering to top end labs.
600 series is already in serial production for quite some time.KrF development is pretty mature right now and it was pretty mature in the 600 series, RSLaser KrF light source was already developed in the 600 series, KrF optics and light sources are way cheaper and easier to make so I don´t think will bog down ArF/ArFi machines production .
Their machines where developed to be used along ASML machines, especially in metal layers and I think will be a prime target for entering the domestic lithography market for companies outside the sanction regime instead of going for the more risky ArF machines. Also can be used by mature nodes 130nm nodes by companies, like auto chips and MEMs.
In my opinion. Due its monopoly status ASML operate under pretty high margins. SMEE? will operate under lower margins, for now. My guess that most components are domestically manufactured. Looks like production is already ramping up so will be more costs reductions than in the R&D phase and with a little bit of help from subsidies these machines can be procured an at ever decreasing cost.I guess you can compensate with multiple machines? SSA800 is likely less economical than ASML machines to start off. But given the latter might not have maintenance, seems like worth the trade off.