The sector, which provides the key material for
, was expected to enter a critical stage of “accelerated breakthroughs and large-scale application” over the coming years, according to Fu Zhiwei, chairman of Xuzhou B&C Chemical, a major domestic supplier of photoresist. Fu, also a deputy to the National People’s Congress, told the South China Morning Post during the “two sessions” annual political gathering last week that the company aimed to achieve mass production of several core photoresist materials used in advanced processes within five years.
Photoresist, used in processes such as photolithography and photoengraving to form patterned coatings on surfaces, is a key input in chip manufacturing. The material is classified by exposure wavelengths, including broadband UV, G-line, I-line, KrF, ArF, EUV, and electron beam types. KrF, ArF, and EUV are the most advanced. While China has achieved a self-sufficiency rate of more than 20 per cent in older G-line and I-line photoresist used for power chips and LEDs, the
including JSR, Tokyo Ohka Kogyo, Shin-Etsu Chemical, Fujifilm Electronic Materials and DuPont.
These foreign companies jointly accounted for nearly 95 per cent of the domestic market, with localisation rates for KrF and ArF photoresist as low as 3 per cent and less than 1 per cent, respectively, according to a Caitong Securities note citing data from the China Electronics Materials Industry Association.
For Xuzhou B&C Chemical, the primary objective was to achieve key breakthroughs in bottleneck areas – specifically KrF and ArF photoresist, according to Fu. “We will mobilise our most formidable resources to launch an all-out offensive in the development of high-end photoresist for more advanced process nodes,” he said. Fu said the company had achieved full-chain autonomy – spanning monomers, resins, photoacids, and end-product photoresist. Its KrF and ArF mid-to-high-end products had already “passed verification at leading foundries” and were beginning to scale up, he added. The company, with its research and development centre in Shanghai and production facilities in Xuzhou city, eastern Jiangsu province, is among a handful seen as China’s best hopes for achieving self-reliance in advanced photoresist. Nata Opto-electronic Material, which focuses on ArF photoresist, said in February that it had an annual production capacity of 50 tonnes and could maintain stable supply for its early-stage orders.
Other competitors in the sector include Shanghai Sinyang, Red Avenue, and Suzhou-based Jingrui. Most have made progress in entry-level materials and are now eyeing a share of the high-end market.