An EDA tool for e-beam lithography (EBL) developed at Hunan University (HNU)
View attachment 85770
The EBL-oriented EDA software tools are indispensable to design and manufacture EUV/DUV masks or sub-10 nm prototype devices. Some international treaties (e.g., 3.D.1-3 of Wassenaar Agreement [1]) and national laws (e.g., 3D003 of U.S. export control laws [2]) impose controls on exporting EBL-oriented EDA software tools to certain countries like China, Russian, etc.
We believe that EBL technologies should be used as friendly tools to improve lives of people from all countries without discrimination, rather than hostile weapons to deter the development of any country. Therefore, we are trying to develop these EBL EDA tools from scratch by ourselves. We license HNU-EBL EDA software, free of charge, to anybody from anywhere. To obtain a license, please click “license” and “contact us” on the top.
If that is not a giant middle finger, i don't know what else it is.