Germany Carl Zeiss, heart of Dutch ASML Lithography Equipment.

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tidalwave

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Of 26 EUV machines ASML delivered in 2019, half of that got delivered to TSMC.

A new kid on the block , beijing' s u-precision claims that they have 65nm cacapble equipment, that's better than SMEE's 90nm.
 

tidalwave

Senior Member
Registered Member
If he is an honest man, he is a National Security threat to the United States.
But don't worry, he will not get into trouble because FBI have very competent lawers and psychiatrists. They know he can not be legally charged for his behaviour.
Both EUV and DUV lithography technology are primarily oversea.US don't do lithography anymore. Why FBI be concern about technology from oversea? US companies don't own those IP. Mr Troll?? Both you , antiterror and the China dude are trolling, don't know anything in this field , just come here to spread personal agendas
 
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tidalwave

Senior Member
Registered Member
Some people wrote to me and said why not skip EUV and directly jump to developing X ray, lithography maybe at 7nm wavelngth. Well at 7nm the light is neither refractive like optical nor reflective like mirrors used in EUV. Basically no optical system available. The mask has to directly on the wafer for direct printing.

Take way the projection optics which provided 4x or 8x reduction, any tiny errors on the mask would directly transfer to the wafer. The x ray mask would be prohibitedly difficult.

Electron beam lithography is very precise and can do anything EUV and X ray lithography can do. Both it's hell of slow, not more mass production.

So, EUV lithography probably the last one practical for mass production.

If you ask that question to chrish, antiterror and china dude trolls, they won't know. Just ignore those useless trolls.
 

antiterror13

Brigadier
Some people wrote to me and said why not skip EUV and directly jump to developing X ray, lithography maybe at 7nm wavelngth. Well at 7nm the light is neither refractive like optical nor reflective like mirrors used in EUV. Basically no optical system available. The mask has to directly on the wafer for direct printing.

Take way the projection optics which provided 4x or 8x reduction, any tiny errors on the mask would directly transfer to the wafer. The x ray mask would be prohibitedly difficult.

Electron beam lithography is very precise and can do anything EUV and X ray lithography can do. Both it's hell of slow, not more mass production.

So, EUV lithography probably the last one practical for mass production.

If you ask that question to chrish, antiterror and china dude trolls, they won't know. Just ignore those useless trolls.

hahhahaha, very angry "top lithography scientist" without any reason
 

Chish

Junior Member
Registered Member
Both EUV and DUV lithography technology are primarily oversea.US don't do lithography anymore. Why FBI be concern about technology from oversea? US companies don't own those IP. Mr Troll?? Both you , antiterror and the China dude are trolling, don't know anything in this field , just come here to spread personal agendas
A real technician who know everything in lithography wouldn't stick around here, defensive and arguing.

Any technologies that China required to overcome US sanctions are big deals to America. Hence America pressures on other countries not to sell them to China. If you are in high tech , you should know better.

Anyone in America helping China to overcome US high tech sanctions is a concern to Trump. FBI definitely would be investigating.

I already said enough.
 

Wangxi

Junior Member
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The most promising semiconductor sector for China is the memory sector ( $124 billion annually, accounting for 30% of the semiconductor industry), I am sure that Yangtze Memory Technologies (YMTC) will challenge Sk Hynix and Micron. it's not for nothing that even during the worst period of the coronavirus in Wuhan, all the factories stopped, except YMTC.
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Please, Log in or Register to view URLs content!
 

manqiangrexue

Brigadier
You are basically a creep who is not really interest in the EUV lithography technology like so many other here.
Oh, I just got called a creep by an old guy who thinks that the reason he can't get married and have kids is because he has a job LOL That's a first!

I'm actually very interested in EUV and semiconductors but unfortunately, I am interested in evidence-backed information rather that empty claims. I understand it's too technical for someone of your level.
You are more interested in personal things.
Then how come you're the one who keeps taking about yourself for other people to analyze? LOL
People can see I add value to the thread.
Really? From what I read, people say you're just here for attention and should be ignored. However, you have managed to convince 1 guy that you bring value... but that's because he doesn't know the difference between a semiconductor and a superconductor so... LOL
You don't. People don't learn anything valuable from personal agenda.
My personal agenda is to ask you for evidence on your claims about Huawei. Evidence is the key to value and learning.
Stay away. We dont need your pollution here. Go back to China where you belong.
The world would become a better place.
Oh, having a little spaz out here? What if I don't stay away? What if I just stay right here and remind you that your claims are without evidence over and over again every time you make them? Too bad you can't just angry-old-cabbage me out of the thread you created, eh? LOL Also, "we" seems to be with me here, as other members seem to like my posts more than your empty claims; just check the ratings.
 
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WTAN

Junior Member
Registered Member
Come on now, no technical feedback? You can do better than that! Mr troll.
Hey Tidalwave
Good to see you are knowledgeable about Lithography.
Yes,i noticed that UPrecison has developed a Dry 65nm Dual stage Lithography machine.
I read that SMEE is using this equipment from UPrecision & adding immersion technology to it.
The new SMEE Immersion lithography machine when ready should have resolution of 45nm and with Multi patterning should have 20-30nm.

Whats holding back DUV Lithography in China? China's best Lithography Optics is the Cnepo Epolith A075 with resolution of 90nm. China having problems developing projection lens technology equivalent to Carl Zeiss.

There is a new Electron Beam Lithography machine from Inst of Optoelectronics Tech Chinese Academy of Sciences. Said to have resolution of 22nm and can do 10nm with multi patterning but the production scale is small. They are trying to improve the machine to allow mass production of Chips. What do you think of this machine?
 
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