The Institute of Microelectronics has made significant progress in heterogeneous integration of GaN HEMT based on 4H-SiC/Diamond composite substrates.
The Institute of Microelectronics, led by Professor Liu Xinyu, has developed a breakthrough in GaN HEMT technology using a
4H-SiC/diamond composite substrate to solve severe heat dissipation issues in high-power devices. Traditional substrates like Si or SiC struggle with thermal management under rising device power and voltage, limiting performance and reliability.
The team introduced a
surface-activated bonding (SAB)-based secondary transfer technique to bond a 784 nm thick 4H-SiC film onto a diamond substrate enabling high-temperature GaN epitaxy while reducing lattice and thermal mismatch. The process achieved up to
98% bonding efficiency, with the transferred SiC film maintaining excellent crystal quality (FWHM comparable to bulk SiC).
After annealing at 900°C, the
interface thermal resistance dropped to 13.6 m²·K/GW the best reported value for 4H-SiC/diamond interfaces due to elimination of an amorphous layer and local recrystallization.
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Experimental results show that GaN HEMTs on this composite substrate exhibit:
This demonstrates significantly improved heat dissipation, reliability, and power performance while preserving process compatibility. The solution holds strong potential for next-generation high-frequency, high-power applications such as 5G/6G communications, satellite systems, and radar.