Chinese semiconductor thread II

[tphuang]

Can you point out to which part of the article is trash or fake? I didn't see anything out of ordinary for me.

=> The Korean media is all trash media that shouts anti-Chinese sentiment and anti-communism. They make news about China facts, but end with negative news about China in the middle or at the end. That's why when you watch Korean media news, you end up with a negative perception of China.

“SK하이닉스 중국 공장에서 생산한 D램으로 장난친 것”
=> Playing with DRAM produced at SK Hynix’s Chinese factory

The above Korean article is a news article based on TechInsights. It is wiser to read the original TechInsights article.

We have posted TechInsights, but it is also very interesting to read the alarm on the subject from Korean chip makers. People seem to have no problem posting any number of Western articles on China's chip sector, despite the same negative propaganda.

Frankly, you have a lot of nerve as a new poster to lecture me on what can or can't be posted here.

Mingga Semiconductor successfully prepared 4-inch gallium oxide crystal for the first time.​

Beijing Mingga Semiconductor Co., Ltd. has successfully produced a 4-inch gallium oxide crystal blank for the first time in the world. The successful gallium oxide crystal blank grew to a diameter of 4 inches and a thickness of 55 mm. After processing, the usable size is 3 inches and the thickness is up to 40 mm. Under the same process conditions, the more device chips are manufactured with gallium oxide, the lower the unit device chip manufacturing cost, and the more obvious the cost-effectiveness of gallium oxide.

This technological breakthrough not only optimizes the crystal growth environment, but also makes it possible to produce a crystal blank with a usable thickness greater than 40 mm. This is not only a technological breakthrough, but also promotes the development of the industry. Large-sized gallium oxide substrates can effectively reduce production costs, improve production efficiency, and accelerate the widespread application of gallium oxide materials in various fields.

As a fourth-generation semiconductor material, the cost of gallium oxide is about one-third of that of the third-generation semiconductor material silicon carbide. Its basic power devices have the characteristics of high voltage resistance and low loss. The products made from it have significantly improved energy efficiency and endurance performance. For example, in the field of new energy vehicles, the driving range of a car using gallium oxide devices on a single charge is 10% to 20% higher than that of a car using traditional silicon devices.

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GaO supply chain/ecosystem in China is really building up. You need multiple players to foster innovation.

 

[tokenanalyst]

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If DeepSeek was some sort Black Swan event for these people, EUV is going to be the mother of all Black Swans.

 

[tokenanalyst]

Helin Micro-Nano: Automotive-grade 2DMEMS probe card, three-temperature test completed acceptance.​

As the demand for automotive chips grows significantly, more and more analog chips are upgraded from consumer chips to automotive chips. Due to the strict quality management requirements of the automotive industry, the increase in reliability requirements has brought about the need for three-temperature testing of chip wafers (-40℃~125℃).



For power management chips, some wafers require Trim in addition to the three-temperature CP test, and most require True Kelvin CP Test. Without changing the chip layout (on the one hand, it has cost advantages, and on the other hand, it is conducive to the early realization of automotive-grade chip mass production), traditional cantilever cards can no longer meet the requirements.

This places extremely high demands on wafer CP test probe cards, which are as challenging as 2D MEMS probe cards with tens of thousands of pins on SoC chips.

Helin Micronano is the first domestic MEMS probe card solution provider to complete the mass production of True Kelvin CP Test on 80 μm x 80μm PAD size . The needle marks of the produced MEMS probe cards in mass production at the client's end are as follows, with the maximum double needle gap of 15um.

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[tokenanalyst]

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If DeepSeek was some sort Black Swan event for these people, EUV is going to be the mother of all Black Swans.

But I don't think they will announced, i think they will keep it a secret and everyone will think they are making 3nm with immersion.

 

[tokenanalyst]

Total investment of 1 billion yuan! BOE Zhuhai Jingxin MiniLED production line officially put into production.​

BOE's MLED business Zhuhai BOE Jingxin Technology held a lighting ceremony recently, marking the entry of BOE Zhuhai Jingxin Mini LED production line into a new production stage.

It is reported that Zhuhai Jingxin Technology has further improved production efficiency and product quality through the upgrade of COB production line. The upgraded production line can not only meet the needs of larger-scale production, but also greatly improve the stability and accuracy of the products, ensuring the competitiveness of Mini LED products in the global market. The production cycle of the factory has been significantly shortened, and the combination of automated equipment and refined management has made production response faster, providing a strong guarantee for the layout of the global market.

On the day of the lighting ceremony, Mr. Liu Yi, Vice President of BOE Technology Group and CEO of BOE MLED Business, Mr. She Xiaomin, Vice President and COO of BOE HC SemiTek, Mr. Fu Liang, General Manager of BOE Jingxin Technology, and company employee representatives attended the ceremony. At the ceremony, Mr. Liu Yi and Mr. Fu Liang jointly unveiled the product and announced that Zhuhai Jingxin COB product was successfully lit.

In September 2024, Zhuhai BOE Jingxin Technology Co., Ltd. was officially unveiled, announcing the full launch of BOE's MLED Zhuhai project. The total investment of the project is about 1 billion yuan, and the site is located in Huafa Pingsha Electronic and Electrical Industrial Park, with a plant area of more than 40,000 square meters. The project is scheduled to start construction in September 2024, and the equipment will be moved in at the end of December. In the first quarter of 2025, the MLED direct display products will be lit up and will be fully mass-produced.​

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[tokenanalyst]

Hesai Technology: Obtained Exclusive Mass Production Designation for LiDAR for Multiple Brands and Models of Dongfeng Motor Group​

Hesai Technology, Hesai Technology recently announced that it had obtained the exclusive mass production order for laser radars for multiple brands and models of Dongfeng Motor Group, including Lantu.
The cooperative models will be launched in succession from 2025 and will be equipped with Hesai's compact ultra-high-definition long-range lidar ATX.
Currently, ATX is steadily advancing towards the mass production stage, and is planned by many customers as the standard configuration for mass production models in 2025. So far, Hesai has obtained more than 100 pre-installed mass production designated models from 22 automakers.
The maximum detection distance of Hesai ATX LiDAR reaches 300 meters, which is 50% higher than the previous generation AT128. It can support up to 256 lines, and the best angular resolution reaches 0.08° x 0.1°, which is more than twice that of AT128.

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[tokenanalyst]

The mass production of Zhiwei Technology's single-chip sulfuric acid cleaning machine exceeds 700,000 pieces - high-end process equipment "puzzle".​

SPM ( Sulfuric Peroxide Mixture ) is an important process for photoresist removal and cleaning in the front-end process. The commonly used volume ratio is between 2:1-4:1 .

The S300-SPM officially launched by Zhiwei Technology in 2022 has become the first domestically produced 12- inch sulfuric acid cleaning machine for large-scale mass production lines . This model of equipment preheats H₂SO₄ to 80℃~150℃ , and then mixes H₂O₂ in real time in the mixing pipeline designed with a monolithic cavity nozzle . The exothermic reaction generated by the mixing can heat the mixture to a temperature of >140℃ , greatly enhancing the ability to remove photoresists, shortening process time, and reducing process steps.



Zhiwei Technology's S300-SPM has been applied to the 12- inch logic mass production line of a leading domestic customer . The monthly production capacity can reach more than 60,000 pieces, and the cumulative output of a single machine exceeded 700,000 pieces as of last week . This is the only single machine in China that has achieved this mass production data.

The design of Zhichun's single-wafer cleaning machine adopts the architecture of world-class equipment, with its own patents and technical layout; the client can use the same recipe architecture as international manufacturers for verification, and the process indicators such as organic matter removal efficiency, particles, etching rate, etching uniformity, etc. are also matched with the equipment of Japanese manufacturers. It took only more than two months from the first single-wafer cleaning equipment to meet the client's process indicators and start product verification. With good performance, it has achieved full coverage of nearly ten post-etch cleaning processes. Indicators such as Uptime , WPH , process spec and product yield have reached the same level as foreign competitors.

S300-SPM can also be widely used in wet cleaning processes in the fields of 12 -inch storage, image sensors, etc. As an innovative supplier of domestic high-end single-wafer cleaning equipment, Zhiwei Technology is committed to providing "advanced and reliable complete solutions for wet process equipment" to leading customers in the industry.​

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PNC Systems Wet Equipment research updates.​

The research and development of high-end wet equipment that responds to advanced processes, and has achieved initial results on machines that are still monopolized by international manufacturers, such as high-temperature sulfuric acid, FIN ETCH, and monolithic phosphoric acid, the company's verification and delivery progress is leading in China. The company's S300-SPM model is the first domestically produced sulfuric acid cleaning machine used in a 12-inch mass production line,. with a monthly production capacity of up to 60,000 pieces. So far, the cumulative output of a single machine has exceeded 700,000 pieces.

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[Wahid145]

We have been seeing a lot of surprises in the Western Countries (including SK) regarding China recently, be it the 6th Gen Fighter, Xiaohongshu, DeepSeek, Unitree (I think these westerners still can't comprehend the Chinese Robotics Development and the consequences of it) or CXMT D1z DDR5.

The only two missing piece of puzzles now are EUVL and DUVi. The amount of research papers @tokenanalyst is showing us here in regards to the EUVL, it feels like the calm before the storm (the storm being innovative products upon products when it comes to EUVL from China in next few years or so). They will literally commoditize EUVL in mid 2030s just like every other thing China grabs a hand on. Can't wait for that tsunami to start!

Sometimes it still feels hard to believe EUVL is the last bastion stronghold the West has when it comes to Choaking China... This country has come a long way in last 8-10 years after being punched in the face by the "most powerful country in the world" with sanctions tariff and all the nasty things with kidnapping the daughter of a CEO etc and etc.

 

[Hyper]

But I don't think they will announced, i think they will keep it a secret and everyone will think they are making 3nm with immersion.

Actually the more layers with DUV the cheaper the node. N3B failed in comparison to N3E commercially because it has more EUV layers. DUV is a workhorse and always will be.

 

[Wahid145]

Actually the more layers with DUV the cheaper the node. N3B failed in comparison to N3E commercially because it has more EUV layers. DUV is a workhorse and always will be.

Can you elaborate more on it? What was the main reason? Slower Wafter Output due to EUV or something else in regards to N3B and N3E?