Samsung Electronics' current difficulties lie in its serious yield issues.
First, the problems in the memory sector are as follows.
Another factor is the continued adherence to high-difficulty processes. Samsung Electronics is currently using the TC-NCF (Thermo Compression-Non Conductive Film) method to produce HBM. Unlike the existing bump technique, this method uses films to implement fine bonding, but it has the disadvantage of a complex manufacturing process and high costs. In particular, it is said to have limitations in that stability in high-speed operations and high-temperature environments is relatively low.
In contrast, competitors are producing HBM using the MR-MUF (Mass Reflow-Molded UnderFill) method, which implements precise bonding between chips using liquid underfill materials. It has relatively high yields and stability, and it meets the standards of customers such as NVIDIA. Recently, a competitor developed the world's first 16-layer HBM3E, and announced that it is also optimal to produce it using the MR-MUF method. This is the background to the evaluation that the reason Samsung Electronics lags behind its competitors in HBM technology is due to this production method.
The problems in the foundry sector are as follows.
Samsung Electronics attempted to gain a technological advantage by developing the world's first 3nm process, but failed to secure major customers due to yield issues. In particular, it is reported that the 3nm process using the
gate-all-around (GAA) structure is more difficult than the existing FinFET process, making it difficult to stabilize the yield.