Major domestic giants reshape the landscape of ion implanters.
Three major Chinese semiconductor equipment firms Huahai Qingke, Naura Technology, and Lead Microelectronics’ subsidiary KST are accelerating domestic breakthroughs in ion implanters, a critical but long-monetized technology in chip manufacturing previously dominated by U.S. and European companies like Applied Materials and Axcelis (with $1.427 billion in 2024 imports).
KeyStone leads in rapid deployment, having delivered over 40 units by H1 2025, including 5+ million wafers via its 12-inch low-energy high-current implanter. It covers advanced logic, memory, power devices, and CIS with full-spectrum models and has passed key product validations (e.g., 28nm, dark current control).

Huahai Qingke entered quickly through acquisition of Xinyu Semiconductor, launching its first 12-inch low-temperature implanter (iPUMA-LT) in July 2025 and showcasing a high-current model with advanced beam ramping. Leveraging existing CMP customer ties, it aims to replicate its success in front-end equipment.

Naura Technology, entering the market only in March 2025, boasts top-tier performance in accuracy, uniformity, and stability particularly in 3D NAND applications (beam efficiency >90%). With a planned 200-unit annual capacity starting in 2024 and partnerships with Yangtze Memory and Changxin, it targets high-end and emerging semiconductor needs.

Differentiated Pathways:
Technology:
KST emphasizes precision and modular design.
Huahai Qingke leverages integration via acquisition.
Naura relies on plasma/RF platform expertise for broad, high-end coverage.
Strategy:
KST focuses on niche mass production.
Huahai Qingke builds a "second growth curve" with existing customers.
Naura aims to become a full-front-end solution provider.
Ecosystems:
KST benefits from vertical integration.
Huahai from customer reuse and synergies.
Naura from deep industry partnerships and massive R&D investment (RMB 5.371 billion in 2024).
Market Outlook:
While imports still dominate, domestic production is gaining ground especially in low-energy high-current implanters. The next phase will focus on mass production capacity, customer trust, and verification in high-end applications (e.g., advanced logic, 3D NAND). To succeed against global competition, the three firms must collaborate on core component localization and technical standardization.
This "three-way battle" marks a pivotal shift toward China’s semiconductor industry self-reliance moving from isolated breakthroughs to a multi-pronged, competitive push for full control over front-end manufacturing.
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