@tokenanalyst bro for us common layman, can you describe the difference between ASML NXT 1980i , NXT 2000i and NXT 2050i , from what I know from my previous discussion with
@WTAN @foofy @krautmeister and
@FairAndUnbiased its all about optics, power sources and software? 2nd is NXT 2050i the last of ASML DUVL and the world most advance cause they can't find anymore improvement?
The resolution of any lithography system is a simple equation k1 * (LS /numerical aperture)
LS = light source of the system
NA = optics or mirrors and the refraction index of the medium.
k1 = factor for aberration, diffraction and such.
Decreasing the wavelength increase the resolution, increasing the NA increase the resolution and decreasing the k1 factor increase the resolution.
The most straight forward method is to decrease the wavelength of the light source, that is what ASML did by going EUV.
Is possible to use shorter wavelength laser in DUV but lasers with wavelength shorter than 193nm have technical problems.
The NA is hard limited by the refraction index of the medium for air is 1 and water is 1.33 and the optics, for a dry system the theoretical limit NA for a dry system is 0.8-0.9. One option is to use a high n-index fluid to increase the numerical aperture like n=1.6-1.7, but that fluid has to be highly transparent to DUV light.
The only factor left is k and there is were most of the resolution increase in the last decade has come. So i think they don't see more use to tweak the software and the hardware to archive minimal gains in resolution. They are starting fresh again with a with new type of lithography EUV and then tweak that to archive better resolution without too many tricks.