Research on wafer stage overlay-μDBO(micro Diffraction Based Overlay) targets by lithography imaging simulation software
1. Front-end System and Integration Engineering Department, Shanghai Micro Electronics Equipment Group Co., Ltd.,(SMEE) Shanghai 201203, China;
2. Metrology Equipment Department, Shanghai Micro Electronics Equipment Group Co., Ltd., (SMEE) Shanghai 201203, China;
3. Shanghai Key Laboratory of Lithographic Optics and Inspection, Shanghai 201203, China
Abstract:Overlay targets with a small range and requiring extremely high measurement accuracy are used in the lithography system's alignment, exposure, and measurement processes. They are inevitably affected by many errors when performing specialized functions, e.g., line width and design difference, line edge roughness, and target edge effect. This paper conducts a simulation study on the micro diffraction-based overlay target (μDBO) in the condition of wafer stage overlay (WSO), which is commonly used in lithography, based on the design of overlay alignment targets in the field of measurement. Litho-target design simulation software is known to be more advanced than lithographic imaging simulation software, but its license is usually rarer and more expensive. We propose a novel method for simulating lithography target metrology results using lithography imaging simulation software. The method predicts the detected light intensity distribution in the experiment qualitatively and can calculate target performance in metrology.