Tongcheng New Materials: The photoresist project phase has been completed and has gradually entered the trial production phase.
Tongcheng New Materials announced that the company's wholly-owned subsidiary Shanghai Tongcheng Electronic Materials Co., Ltd. ("Tongcheng Electronics") invested in the construction of an annual output of 11,000 tons of semiconductors and flat panels in the Shanghai Chemical Industry Zone. The engineering phase of the display photoresist and 20,000 tons of related supporting reagents projects has been completed, and it has gradually entered the trial production phase.
The announcement shows that the engineering phase of the project has been completed and it has gradually entered the trial production stage. The company's Shanghai Chemical Industry Zone factory covers an area of 36,200 square meters and has a designed annual production capacity of 1,000 tons of semiconductor photoresist, 10,000 tons of display photoresist and 20,000 tons of high-purity EBR reagent (photoresist edge remover). At the same time, driven by strategic cooperation with international and domestic semiconductor manufacturers and photoresist manufacturers, production line optimization and quality control upgrades have been completed. Details are as follows:
1. Semiconductor photoresist production capacity construction situation
The company's Shanghai Chemical Industry Zone factory has an annual semiconductor photoresist mass production line with an annual output of 1,000 tons, which mainly includes an annual 300/400 tons ArF and KrF photoresist mass production line. By using ultra-high purity PFA (coating) equipment , the introduction of a high-precision material flow control system, coupled with a self-developed high-precision and high-efficiency photolithography filtering system, can achieve ppt-level metal impurities and 0.1um-level particle control, and has the production capacity of advanced process photoresists with different formulas.
2. Semiconductor photoresist product development and mass production capabilities
(1) ArF photoresist product situation
In terms of ArF photoresist products, the company has completed the development of some models of ArF photoresist. The shipping indicators of the first batch of ArF photoresist can benchmark the products of major international photoresist manufacturers, and it has mass production capabilities. Currently It is in the photolithography process testing and product verification stage before mass production, and there is still some uncertainty whether it can pass the verification.
The production capacity can supply most domestic chip manufacturers at the same time, and can better meet part of the domestic demand for advanced process photoresist.
(2) G-line, I-line and KrF photoresist products
At present, the company's G-line photoresist has occupied a large domestic market share; I-line photoresist has been widely used in domestic 6", 8", and 12" integrated circuit production lines, and the supported processes cover 14nm and above processes. There are more than 20 types of KrF photoresists in mass production, which are stably supplied to domestic leading chip manufacturers.
3. Construction and development of other electronic chemical projects
In order to meet the demand for high-purity solvents required for ArF photoresist and domestic advanced manufacturing processes, the company has completed the construction of high-purity EBR equipment, becoming the first domestic company to build high-purity EBR distillation tower equipment and master high-purity distillation technology. Local solvent supplier.