Chinese semiconductor industry

WTAN said:

Thanks for the explanation Manqiangrexue.

I understand that everyone wants evidence about new developments in the form of Newspaper articles from China sources and even Japanese, Taiwanese and even from the CIA controlled New York Times. I dont blame them.

The information i provided about CETCs 45nm Lithograph is so recent that i doubt many journalists in China even know about it. Most articles about CETC are written when their Semiconductor machinery has already been delivered to the customer.

I managed to get hold of this report below:

January 06, 2021 at 12:28. On January 5, the groundbreaking ceremony of the China Electronics Technology (Beijing) integrated circuit core equipment autonomous and industrialization construction project (Phase I) was held in Beijing, China Electronics Technology Deputy General Manager Yang Jun, Deputy Director of the Management Committee of Beijing Economic and Technological Development Zone and member of the Working Committee Chen Xiaonan attended the ceremony.

This is another landmark project for the independent and controllable development of the core equipment of integrated circuits in China Electronics Technology's system. It is important for solving the problems of broken and short chains in the national integrated circuit industry and building an equipment system that supports the independent and controllable development of integrated circuits in my country. Significance.

This project is the assembly of lithography machines, with an annual output of 20 lithography machines. The specific product plan is shown in the table below. (Note that this is not a lithography machine from Shangwei, but a lithography machine assembled by CEC. CEC has the maintenance and assembly capabilities of lithography machines.)
Serial number Product name Product specification unit Annual output
1 Lithography machine 0.35μm 12
2 0.13μm lithography machine 6
3 Lithography machine 65nm units 2
4 Total units 20
Expected date of commissioning: 2021.12 The

project is located in the X45F2 plot of the Beijing Economic and Technological Development Zone and will be constructed in two phases. This project is the

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This report is about the commencement of construction of CETCs Lithograph factory.
It mentions production of 2 Units of 65nm Lithographs by the end of 2021.
Now, CETC labels its DUVL as having 65nm Resolution.
(Unlike SMEE which uses for eg 28nm node or 65nm node)
This means CETCs DUVL is called a 45nm node DUVL or in other words is able to produce a 45nm Chip with a single exposure. CETC prefers to specify their DUVL as having 65nm resolution similar to ASML, Nikon etc.

Hope you are all convinced now.

Click to expand...

ansy1968 said:

@WTAN,

What you said is that the 45nm DUVL is comparable to the latest ASML and NIKON DUVL or the current DUVL use by SMIC? If the same then SMIC can produce its 8nm N+1 using this machine or even the 7nm N+2. Therefore SMEE 28nm (single exposure) is more advance and can produce 5nm with multiple patterning?

Click to expand...

WTAN said:

Just a misunderstanding, no worries.
The CETC 45nm node (65nm resolution) DUVL is less advanced than the SMEE 28nm node (38nm resolution) DUVL.
But CETC is doing alot of R&D and will eventually catch up with SMEE. They aim to eventually produce their own 28nm node DUVL very soon.
CETC and SMEE are systems integrators and as long as the subsystems are available, they will produce more advanced Lithographs.

Just heard that ICRD is doing EUV Lithograph R&D using the Light Source from the Shanghai Synchrotron. They have a prototype EUV equipment of some sort & are working on it. Not much else information available.

Click to expand...

WTAN said:

Just heard that ICRD is doing EUV Lithograph R&D using the Light Source from the Shanghai Synchrotron. They have a prototype EUV equipment of some sort & are working on it. Not much else information available.

Click to expand...

Skywatcher said:

Interesting, the Shanghai Synchrotron Radiation Facility cost $176 million (an entire NXE3400B costs around $130-150 million IIRC)

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Wonder if you could operate the ICRD EUVL with a smaller synchrotron (though obviously the operating and maintenance costs would at least likely be an order of magnitude higher, and likely greater downtime)?

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WTAN said:

It could work. A smaller Synchrotron that can provide light sources for a number of EUV Lithographs at the same time might make it viable economically.

But utilising this Synchrotron is really a brilliant idea from ICRD and CAS. This allows them to get down and do real research on EUV Lithography without having to wait for the actual LPP or DPP Light Source to be ready. They are getting a powerful light source possibly 250W to 300W to work with.

They can do work on the Optics and the Work Bench immediately. ICRD can also work on the techniques for fabrication of 5nm Chips and they can also test materials like EUV Photoresists, Masks etc.

This might accelerate China's EUV development efforts considerably.

Click to expand...

WTAN said:

Thanks for the explanation Manqiangrexue.

I understand that everyone wants evidence about new developments in the form of Newspaper articles from China sources and even Japanese, Taiwanese and even from the CIA controlled New York Times. I dont blame them.

The information i provided about CETCs 45nm Lithograph is so recent that i doubt many journalists in China even know about it. Most articles about CETC are written when their Semiconductor machinery has already been delivered to the customer.

I managed to get hold of this report below:

January 06, 2021 at 12:28. On January 5, the groundbreaking ceremony of the China Electronics Technology (Beijing) integrated circuit core equipment autonomous and industrialization construction project (Phase I) was held in Beijing, China Electronics Technology Deputy General Manager Yang Jun, Deputy Director of the Management Committee of Beijing Economic and Technological Development Zone and member of the Working Committee Chen Xiaonan attended the ceremony.

This is another landmark project for the independent and controllable development of the core equipment of integrated circuits in China Electronics Technology's system. It is important for solving the problems of broken and short chains in the national integrated circuit industry and building an equipment system that supports the independent and controllable development of integrated circuits in my country. Significance.

This project is the assembly of lithography machines, with an annual output of 20 lithography machines. The specific product plan is shown in the table below. (Note that this is not a lithography machine from Shangwei, but a lithography machine assembled by CEC. CEC has the maintenance and assembly capabilities of lithography machines.)
Serial number Product name Product specification unit Annual output
1 Lithography machine 0.35μm 12
2 0.13μm lithography machine 6
3 Lithography machine 65nm units 2
4 Total units 20
Expected date of commissioning: 2021.12 The

project is located in the X45F2 plot of the Beijing Economic and Technological Development Zone and will be constructed in two phases. This project is the

***************************
This report is about the commencement of construction of CETCs Lithograph factory.
It mentions production of 2 Units of 65nm Lithographs by the end of 2021.
Now, CETC labels its DUVL as having 65nm Resolution.
(Unlike SMEE which uses for eg 28nm node or 65nm node)
This means CETCs DUVL is called a 45nm node DUVL or in other words is able to produce a 45nm Chip with a single exposure. CETC prefers to specify their DUVL as having 65nm resolution similar to ASML, Nikon etc.

Hope you are all convinced now.

Click to expand...

Alb said:

Try this

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