If their light source is this powerful makes me wonder if they’re skipping straight to high NA.
Chinese semiconductor industry
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Guangdong project. Maybe related to Huawei..lol
I'm far from an industry expert, but if I understood it correctly, the factory workers in these plants need to be engineers, they need to at least decently educated.
This isn't that hard to find in China because of how inflated science university degrees became, as anyone with a passing interest in science is able to get one, but then these people are unable to find desirable white collar employment.
What are the chances US just tried their normal spiel of putting in paperless immigrant labor, prison labor or barely literate members of the ghetto or trailer park tribes? If the job requires some level of scientific education, knowledge of mathematics etc then a lot of US unskilled labor will not be able to meet the requirements.
There is zero chance of using unskilled labor in this, but I think you exaggerate the difficulty of operating said machinery. I’ve never worked on chip manufacturing but have had some internship experience with semi-conductor lasers at a top ranking engineering University. The technicians are a lot better at making quality devices than the supposedly better educated students or even profs.
Don't know about skill requirement in US semiconductor industry，but ex-convict can certainly be hired
Intel employee beating coworker to death with baseball bat
Simmons, 50, was booked into the Maricopa County Jail on charges of and aggravated assault and is being held on a $1 million cash bond. Simmons has a previous felony conviction, for aggravated assault with a deadly weapon, according to FOX10 Phoenix.
That doesn’t mean he is necessarily uneducated though. The guy who killed a Chinese female university student in Urbana Champaign was a PHD student.
Jiashan Fudan Research Institute and Fudan University team made a breakthrough in the research of next-generation frequency synthesizer
The next-generation microwave and millimeter wave communications with multi-standard, high data rate and high channel capacity put forward stricter requirements on the system local oscillator signal.
Recently, for key indicators such as frequency modulation range, phase noise and chip area in the frequency synthesizer, the team of Professor Yan Na of Fudan Research Institute in Jiashan proposed a sub-sampling phase-locked loop architecture integrating multi-mode LC voltage-controlled oscillators. The relevant results were published in IEEE Journal of Solid-State Circuits (JSSC), the top journal in the field of integrated circuit design, titled "Analysis and Design of a Dual-Mode VCO With Inherent Mode Compensation Enabling a 7.9–14.3-GHz 85-fs-rms Jitter PLL" . Wang Yizhuo, a doctoral student at Fudan University, is the first author, Director of the Chip Design and Testing Center of Jiashan Fudan Research Institute, Professor Yan Na, Deputy Dean of the School of Microelectronics, Fudan University, Deputy Director of the RF Chip Design Department of Jiashan Fudan Research Institute, and Xu Hao, a young researcher of Fudan University Ph.D. is the co-corresponding author.
Revenue continues to grow, and VeriSilicon’s net profit in 2022 will increase by 4.5 times year-on-year
Jiweiwang news (text/Bai Yuxuan) On February 23, VeriSilicon released its 2022 performance report, stating that the company expects to achieve operating income of 2.679 billion yuan, a year-on-year increase of 25.23%; the rapid growth of operating income has driven the company's profitability to continue to improve In 2022, it is estimated that both the net profit attributable to the owners of the parent company and the net profit attributable to the owners of the parent company after deducting non-recurring gains and losses will be profitable.
In addition, VeriSilicon is expected to realize a net profit of 73.8143 million yuan attributable to the owners of the parent company, a year-on-year increase of 455.31%; it is expected to realize a net profit of 13.2906 million yuan attributable to the owners of the parent company after deducting non-recurring gains and losses, turning losses into profits year-on-year.
Li Xinghui's team from Shenzhen International Graduate School of Tsinghua University made new progress in the field of ultra-precision grating interferometry
Recently, Li Xinghui's team from the Shenzhen International Graduate School of Tsinghua University and the National University of Defense Technology team jointly proposed a heterodyne three-free grating interferometer based on a reflective two-dimensional grating. The team independently designed a dual-frequency laser system with high photosensitivity, high frequency difference and high signal-to-noise ratio. Based on a two-dimensional reflective grating and an innovative common optical path design, a three-degree-of-freedom displacement measurement system was built, and the heterodyne signal was designed and optimized. The phase detection algorithm finally achieves sub-nanometer measurement resolution and repeated positioning accuracy. This work will effectively promote the development of multi-degree-of-freedom grating precision positioning technology.
Multi-degree-of-freedom precision positioning technology plays an important role in nanometering, microscopic imaging, precision machine tools, semiconductor manufacturing and other fields. Taking semiconductor manufacturing as an example, the lithography machine is the "Pearl in the Palm" of the semiconductor industry. In the advanced process lithography machine, the wafer stage requires six degrees of freedom ultra-precise positioning technology with sub-nanometer displacement measurement accuracy. At present, laser interferometers and grating interferometers are commonly used in lithography machines to perform multi-degree-of-freedom ultra-precise positioning of the wafer stage. Environmental noise and Abbe error, and the grating interferometer based on the grating pitch is becoming the mainstream method for ultra-precision positioning of the wafer stage of the lithography machine.
(a) The six-degree-of-freedom measurement system of "four reading heads-four gratings" in the wafer table of the lithography machine; (b) the basic principle of the heterodyne three-degree-of-freedom grating interferometer
In response to the ultra-precise positioning requirements in advanced equipment such as lithography machines, the team proposed a new type of three-degree-of-freedom grating interferometer based on the principle of heterodyne interference, which can achieve sub-nanometer measurement resolution and repeatable measurement accuracy. The four-reading head-four grating" wafer stage measurement system can realize six-degree-of-freedom displacement/angular displacement measurement. The heterodyne grating interferometer uses a beam of dual-frequency laser to generate heterodyne interference through four beams of diffracted light from a two-dimensional reflective grating, and realizes the displacement measurement of the grating in the X/Y direction. The light produces heterodyne interference to realize the displacement measurement of the grating in the Z direction, thereby completing the three-free displacement measurement of the grating ΔX, ΔY, and ΔZ. This solution innovatively uses a two-dimensional reflective grating, which is conducive to the integration and miniaturization of the reading head of the optical path system. In future applications, the reading head and the grating can be installed on the fixed part and the moving part respectively to detect the movement of the moving part. Displacement, which has wider applicability than measurement methods based on transmission gratings.
In addition, the research team proposed and adopted a self-designed dual-frequency laser system, which has a larger and more stable frequency difference and stronger laser power than traditional commercial dual-frequency lasers based on the Zeeman effect, enabling more High light source stability, signal-to-noise ratio and larger heterodyne frequency are beneficial to improve the overall accuracy and measurement speed of the system. The final experimental results show that the system has a resolution of 0.5 nm, a repeat positioning accuracy of 0.6 nm and a measurement linearity of 2.5×10 -5 . The heterodyne three-degree-of-freedom grating interferometry method proposed in this study is conducive to the development of multi-degree-of-freedom ultra-precise positioning technology, and at the same time has guiding significance for the development of advanced equipment and precision instruments, especially for nanoscience that requires multi-axis ultra-precise positioning And technology.
(a) Self-designed dual-frequency laser system; (b) Heterodyne three-degree-of-freedom grating interferometer measurement system
(a) Three-axis resolution test results; (b) Three-axis repeat positioning accuracy test results at 10 nm and 40 nm
The relevant results were published online in the instrumentation field journal "IEEE Instrument and Measurement Transactions" (IEEE Transactions on Instrumentation & Measurement).
The first author of the paper is Zhu Junhao, a 2020 graduate student at the Shenzhen International Graduate School of Tsinghua University, Associate Professor Li Xinghui of the Shenzhen International Graduate School of Tsinghua University is the corresponding author, and the National University of Defense Technology is the co-corresponding author unit. The research work has been supported by projects such as Guangdong Basic and Applied Basic Research Fund, National Natural Science Foundation of China, Tsinghua University Research Startup Fund, Hunan Provincial Natural Science Foundation, and China Postdoctoral Science Foundation.
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