I think a more fruitful way of looking at these goals is seeing if there are any gaps where China's tech industry is stalled or severely hampered. Even if true self-sufficiency is long-term, there have to be enough bridging strategies to get there: i.e., smuggling US equipment, getting alternative suppliers from abroad, buying off-the-shelf chips instead of self-developing them, maintaining stockpiles etc. It would be absolutely unacceptable if a Chinese tech company had to sit and wait for two years twiddling its thumbs.
I wasn't writing a long essay. I was assuming some basic understanding of the context and industry. Chinese semiconductor industry is a very large although fragmented one. I obviously couldn't possibly suggest "Chinese tech company had to sit and wait for two years twiddling its thumbs." This is very silly argument.
The majority of Chinese semiconductor industry is below 28nm, so are the demands. So clearly the construction of fabs of mature nodes have relatively lower risk and much lower cost. They should obviously continue to build, and utilize domestic equipment and materials as much as possible. It's the construction of higher end nodes that are risky and costly.
That's what the contours of the conversation should be about, not hyper-focusing on narrow goals. Having said that, it's well accepted that SMEE will be supplying its 28nm ArF immersion lithography machine next year (it's also been reported that SMIC has at least one prototype for verification); what basis do you have for claiming that the 28nm goal will take 2-3 years? In that kind of timeframe a domestic EUV solution should be emerging.
Hyper-focused narrow goal? What are you even talking about? It's a straw-man's argument.
First of all, having SMEE's 28nm lithography machine ready by 2021/2022 (the often quoted goal by SMEE) doesn't mean a fab will be ready to produce 28nm chips immediately. It will take time to tune and improve yields. Secondly, lithography machine is just one piece of the puzzle. A fab would need thousands of pieces of equipment. Majority of them, if not all of them need to be domestic. That would be a daunting task and it'll take time. 2-3 years to build a 28nm fab with indigenous equipment and materials? I'm being optimistic. It would be a great achievement.
A EUV solution emerging in 2-3 years? I don't understand what's your definition of "emerging." You could argue an EUV solution is emerging today, given the news/rumors about the progress of some of the key subsystems. But if the criteria are mature and stable production of 7nm and below chips (or even trial production), they're at least 5-10 years away.