Thanks very much bro, from the presentation you will see that they keep on improving and upgrading their DUVL machine especially the NXT1980i from 275 wph to 330 wph. Maybe SMIC had bought a lot of upgrade parts for their machine?
Thanks very much bro, from the presentation you will see that they keep on improving and upgrading their DUVL machine especially the NXT1980i from 275 wph to 330 wph. Maybe SMIC had bought a lot of upgrade parts for their machine?
I think Sichuan University has a patent for "Intensity Pulsed Ultraviolet Light Source System" as far as I know it's a 13.5nm light source..China already has a patent on a 30kW CO2 MOPA laser. They wouldn't file a patent application unless they already had a working prototype. The fact the IOE had a working debris vacuum as part of the 2017 EUV prototype 5 years ago means this 30kW laser is probably already well into R&D with droplet sizes and illumination intervals. I wouldn't be surprised if they already have conversion efficiencies approaching 4%.
I can understand if the light source were considered unstable, but being called weak is definitely very interesting considering 30kW is nearing the frontier for this kind of amplified laser. I think maybe the information you're mentioning might be referring to the entire integrated light source and perhaps comparing conversion efficiencies between Cymer, Gigaphoton and IOE (CAS) light sources? I know most of the problems relate to the debris cloud and premature pellicle contamination directly related to this. Is this what they mean when they say the light source is weak?
Let us stay under China control, Newport workers plead
Staff at Nexperia Newport, formerly Newport Wafer Fab, support the continued Chinese ownership of the plant, according to The Times.
A letter sent to the The Times by the staff association of the facility apparently is trying to head off a possible ruling by the UK government that the 2021 takeover of Newport Wafer Fab by power and discrete semiconductor maker Nexperia NV be reversed.
The Times said the staff association had sent a letter saying they, “fully support Nexperia and its ownership of our site” because it has provided stability, improved job security, wages and working conditions. The staff alliance claims to represent 582 employees at the site.
The takeover of NWF by Nexperia is under investigation by the UK government under the National Security and Investment act, which came into force at the beginning of 2022. Nexperia is owned by a Chinese company called Wingtech Technology Co. Ltd.
A ruling is expected from the government by October 3 but there have been reports that the government will demand the deal be unwound or conditions placed on its continued operation (see ).
The Times reported that letter also said: “We have absolutely no desire to work under a consortium under the stewardship of Drew Nelson, the previous owner, Malcolm Penn [a former board member] and any combination of investment groups . . . some employees are even prepared to resign rather than work under such a stewardship.”
Looks like this this Drew Nelson guy is no very popular.
I thought AMEC is the sole Chinese Etching equipment maker BUT I was wrong there is another one CHINA MICRO CORP and they also have in their product line up a 5nm capable Etching machine, with this coupled with ASML NXT 2050i and in the future NXT 2100i then a N+3 5nm chip is on the horizon. Love the way the author of this article describe it, he wrote it with a lot of patriotic fervor....lol Jia You!!!!
It is conceivable that when the chip process of manufacturers such as SMIC develops to the 5nm process, at least there is no need to worry about facing the problem of "cutting supply" in terms of etching equipment.
Can produce 5nm chips!High-end etching equipment of Chinese companies unveiled and was "stamped" by Samsung and TSMC
According to the latest market news, on April 6, my country's well-known semiconductor equipment manufacturer China Micro Corporation (hereinafter referred to as "China Micro") publicly announced that the plasma etching equipment produced by the company has been applied to international first-line customers from 65 nanometers. To 5 nanometers and other advanced integrated circuit manufacturing production lines and advanced packaging production lines.
Wherein the micro its high-profile 12 inches high etching apparatus , it has been incorporated . 5 nm and less chip core components of the processing step .
As we all know, there are only two foundries that can produce 5nm chips in the world, TSMC and Samsung. China Micro's statement is undoubtedly showing that the company's 12-inch high-end etching equipment has obtained the "seal certification" of the most advanced chip manufacturer in the world. In April last year, China Micro Corporation revealed that the company's high-end etching equipment won bulk orders from international customers.
The chip production of a company involves the supply of hundreds of equipment and parts. For example, since the United States is still unwilling to relax restrictions on EUV lithography machines, SMIC's 7nm and below process chip production cannot be carried out either. At the moment, the major breakthroughs made by high-end etching equipment in China and Microelectronics have undoubtedly ushered in a glimmer of light for the problem of "stuck necks" in my country's chips.
It is understood that in the entire process of chip manufacturing, etching equipment, photolithography equipment, and thin film deposition equipment are the most important three types of equipment. Among them, the etching equipment is more valuable than the lithography equipment we are familiar with. It is the most "burning" expense of a chip factory. The value of wafer manufacturing equipment accounts for 24% , and the lithography equipment is 23%.
China Micro's financial report data shows that the company's etching equipment earned nearly 1.29 billion yuan in revenue in 2020, a year-on-year increase of about 58.49%.
It is conceivable that when the chip process of manufacturers such as SMIC develops to the 5nm process, at least there is no need to worry about facing the problem of "cutting supply" in terms of etching equipment.
New architecture also works. I'm not an expert in architecture but GAA doesn't necessarily need a dieshrink.In my non-expert opinion, I think DUV 3nm is dead on arrival. However, it is doable IF you ignore yield issues, power consumption and the only goals are equivalent density and performance metrics. The amount of equipment you need after 28nm, aside from wafer specific equipment, almost doubles for every node for certain key equipment. So, 3nm node would need over 10 times as much equipment as a 28nm fab per wafer. You would need literally something like 1000+ etchers for a typical fab, it's just nuts. The economics make no sense, especially given that EUV already has superior price-performance at 7nm.
DUV multi-patterning is typically variations of LELE and SADP patterning. At 14nm you have proponents of either LELE or SADP. Once you move beyond 14nm, all processes are basically stacked SADP. So, 7nm would be SADP+SADP such that 3nm would be something like SADP+SADP+SADP+SADP+SADP. There are some other patterning techniques being investigated but they are all for EUV patterning. I don't think anybody seriously worked on anything beyond 5nm DUV multi-patterning because it makes no sense given EUV. I've read some of the discussion concerning N+3 and N+4. I'm not sure where this is coming from but I would be very surprised if they were based on DUV. Yields would be horrendous!
When it comes to DUV, packaging is unquestionably the way to go. Absent EUV, China is going to get stuck at the equivalent of 5nm EUV when it comes to DUV scaling. I'm sure China will have a plethora of commercially available 7nm DUV designs. It's questionable though whether China will ever release commercially viable 7nm 2.5D/3D chips even though I am sure they will be developed. Once DUV 7nm 2.5D/3D chips are developed, we're talking about something around ~2026 which is around when China's EUV will be arriving. In other words, I think China will basically stop scaling DUV designs at 7nm and 14nm 2.5D/3D before China's EUV takes over.
Looking to have 5% auto IGBT market (400k cars a year) by 2023 and 10% auto IGBT market (over 1 million NEVs) by 2025.翠展微规划在2023年,实现车规级IGBT模块市场的市占率达到5%,即约有40万台车搭载翠展微的IGBT模块;到2025年,市场占有率达10%,超过百万台新能源汽车搭载翠展微的IGBT模块。