Chinese semiconductor industry

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caudaceus

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Eh…this list is missing the forest for the trees if you want to talk about difficulty. The *drive* laser interacts with the tin droplet dispenser to generate the actual EUV light. The biggest challenge is in the interaction between those two components and corresponding control system to get optimal production of photons. This is compounded by the fact that the tin droplets also generate debris which can accumulate on your light collectors which then kill the efficacy of your light source, so the debris *cleaning* system within your light source becomes another point of challenge. The entire light source is easily the biggest challenge, and within the component mechanics of the light source it’s not the individual components but the ways they interact with each other that’s most technically challenging.
How about the Lenses?
Georgetown CSET claims that Zeiss had decades/centuries of experience and therefore unbeatable.
 

gelgoog

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How about the Lenses?
Georgetown CSET claims that Zeiss had decades/centuries of experience and therefore unbeatable.
EUV uses mirrors instead of lenses. It has little in common with prior machines. And any country with military optical satellites should have the required lens technology. I suspect the main issue is the light source and developing new materials like the masks to be honest.
 

tokenanalyst

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Guangliwei (Semitronix): In the WAT test, the company's products have achieved high-quality domestic substitution​


Jiwei.com news, recently, Guangliwei said in an institutional survey that the WAT testing machine is one of the necessary equipment for integrated circuit manufacturing. The company's WAT testing equipment has only begun to scale into the new fab in the past two years. Production line. Compared with EDA software, the company's WAT test equipment has the characteristics of higher unit price and relatively short promotion period after verification. 20 units sold.

In the past two years, with the increase in the demand for localization of integrated circuits, especially the necessity of the chip self-sufficiency rate, the "wave of factory construction" in domestic fabs will greatly promote the market demand for WAT testers and promote the company's business of this type. rapid growth. The company's WAT test equipment was initially developed to cooperate with the design of EDA software, and the gradual breakthrough of test accuracy and speed achieved by gradual technical iteration in the later stage is the result of enterprise innovation. At present, in the WAT test link, the company's products have achieved high-quality domestic substitution, so it can support the development of the national integrated circuit industry from point to point in this field.

Guangliwei said that the company has continued to develop in the field of integrated circuit yield for more than ten years. The relevant EDA software is mainly used to design various test chips, and to achieve the yield by conducting electrical parameter testing and data analysis on the test chips after tape-out. purpose of promotion. Customers can use the company's EDA design software to achieve more efficient design of test chips and test structures, and at the same time combine various addressable circuit IP technologies to achieve more than 10 times the area utilization of test chips. The design solutions of conventional test chips, addressable test chips, high-density test chips and product-based test chips provided by the company are widely used in first-class integrated circuit manufacturing and design companies at home and abroad. The process node covers 180nm ~ 3nm, helping integrated circuits from Improve chip performance, yield and stability throughout the product cycle from design to mass production.

Guangliwei said that the company's yield improvement method is based on efficient electrical testing. Therefore, the company's product line has been continuously enriched and expanded around electrical testing techniques and methods, solving the three major links of test object design, testing and data analysis. The problem has formed a business closed loop with improved yield.

First of all, the company started EDA software research and development from the design of the test object, and successfully developed a series of test chip design software, especially the company's addressable test chip, its innovative circuit IP and the placement and winding technology between test structures , the number of test structures in the same area is increased by ten to dozens of times, and the large increase in the number of test structures puts forward higher requirements for the test efficiency of the test equipment. Therefore, not solving the test efficiency problem will lead to EDA software. The advantages of the designed design scheme cannot be effectively brought into play.

Based on the above pain points, in order to solve the test efficiency problem brought by more test requirements of customers, the company has been developing wafer-level fast electrical testing machines since 2010, supporting the company's EDA software design scheme, and selling the equipment as a research and development machine to Used by R&D departments of first-class fabs at home and abroad.

Since then, after nearly ten years of iterative R&D and technological breakthroughs, the current measurement accuracy has reached the high-precision standard below pA level, realizing the upgrade and transformation from R&D machines to mass production machines, making the product application breadth from the R&D link. Extend the application to mass production. Looking back at the development history of the company's WAT test equipment, it can be seen that the WAT test equipment is closely related to the yield improvement field where the company is located, and is a part of the company's yield improvement technology and product ecology. It is in the key link of testing and data source collection, and it is also the company's first product to expand from advanced process development to mass production.

Guangliwei said that the rapid entry of the company's WAT equipment into the mass production line of the fab will highlight the synergistic effect between the company's software and hardware products, and further drive the company's various EDA software to expand from process research and development to broader market space. mass production, thereby driving the growth of the EDA software business.

Guangliwei pointed out that the technical threshold for the development of advanced integrated circuits is relatively high. At this stage, the company's product system combining software and hardware is expanding from advanced process development to mass production line applications, and constantly extending the spatial boundary of the market for yield improvement. In 2019, the company's wafer-level electrical testing equipment first broke the market bottleneck of advanced technology and entered the mass production line, and the market volume of this product expanded dozens of times; in the field of EDA software, the company's EDA software is developing from the advanced technology side. It is gradually applied to the mass production side, and its user base will also extend from the R&D department to the mass production and manufacturing related departments, so as to continue to expand the market application scenarios of EDA software; in 2021, the company's data analysis and management software customer base will enable the company to break through large-scale Wafer factories and high-end design companies have entered into small and medium-sized design companies, and packaging and testing companies and downstream electronics factories have also been included in the company's target user groups, which greatly expands the market space for data software. To sum up, each product line of the company has moved towards a broader mass production line market. In the next two years, the company will take advantage of the original products and technologies to continue research and development in terms of vertical technical depth and horizontal product breadth to create higher The core technical barriers to promote the rapid growth of the company's performance.

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tokenanalyst

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NTU: Photoresist in further customer verification process​


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NTU Optoelectronics said in an institutional survey that the photoresist is in the process of further customer verification. ArF photoresist is a customized product with high technical content and long verification period. At present, the product verification work is progressing steadily with many major downstream customers, and different products have been developed for the different needs of the same customer to meet the diverse needs of downstream customers.

Nanda Optoelectronics further introduced that the main domestic manufacturers of nitrogen trifluoride include Paret Gas (a subsidiary of CSSC 718) and Haohua Technology Liming Institute, which are also actively expanding production. The company hopes to consolidate the cost advantage through volume growth, expand application fields through quality improvement, and continuously enhance the market competitiveness of the company's nitrogen trifluoride products through integrated growth, laying the foundation for building "single champion" products.

Regarding the future planning of fluorine-based special gas, NTU said that fluorine-based special gas has a large amount and good growth space, and has become one of the company's main sources of performance. The nitrogen trifluoride production capacity of Shandong Feiyuan Gas Co., Ltd., a holding subsidiary, has been increased from 1,000 tons at the earliest to 3,800 tons. Last year, the company entered Ulanqab, Inner Mongolia, and plans to build a "7200T annual output of electronic grade nitrogen trifluoride project" in 3 years.

Regarding the expansion plan of hydrogen-based special gas, NTU said that the company plans to build "an annual output of 140 tons of high-purity phosphine, arsine expansion and arsine technical transformation project". The annual production capacity of arsine is 70 tons.

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tokenanalyst

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Jianhua Hi-Tech TZ-606T(CETC) automatic probe test bench was successfully delivered​


According to micronet news, on September 20, the TZ-606T automatic probe test bench sent by Sanhe Jianhua Hi-Tech Co., Ltd. (hereinafter referred to as: Jianhua Hi-Tech) to customers has passed various functional debugging and 24H continuous strict assessment, and successfully completed Ship.

The official micro-message of Jianhua Hi-Tech shows that the TZ-606 series probe test bench is a 6-inch fully automatic model made by Jianhua Hi-Tech. TZ-606T automatic probe test bench mainly focuses on optoelectronic device testing. It adopts robot to automatically load and unload materials to reduce human intervention. It has the functions of CCD image scanning and alignment, wafer pre-alignment, cassette detection and wafer scanning.

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panda_989

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If they can achieve commercially viable yields on this 7nm GPU design in the next 18-24 months, no matter how good/bad the design actually is, it will turn out to be yet another watershed event. Generally speaking, if they can make a decent GPU, even in the low/medium range of Nvidia/AMD mainstream lines, they definitely can build a GPGPU off that GPU design. Forget about the graphics card market. GPGPU for supercomputing and AI applications is the real deal. A made-in-China GPGPU at 7nm, even around 2024/2025 with commercially viable yields, would essentially break up all bleeding edge sanctions. From that point on, it would be US in general and Nvidia/AMD in particular really worry about their future in high-performance computing.
Hope u create twitter again but not with name olala you should write it with disguise name
are you panda on twitter.
yes my bro
 

tphuang

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2 new CRCC plants for auto chips after getting orders from Renault. Each plant will be producing 360k wafers a year. Since Renault really doesn't have a presence anymore, I can only assume this is a large export order.

IIRC, CRCC produces about 20% of auto chips for the Chinese market. So, this is a major win for them.
 
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