UNISOC can always tap-out in SMIC.
Chinese semiconductor industry
- Thread starter Hendrik_2000
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UNISOC sell a lot of 4G chips. SMIC N+2 is equal to TSMC 7nm. Should the war break out, UNISOC is the only one immune to sanction.
XiaoMi, Oppo better start design with UNISOC chips before it is too late.
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It can be seen that when President Bai announced in 2020 that he would solve the EUV lithography machine with a stuck neck, the Chinese Academy of Sciences had already worked hard for at least 18 years.
Obviously, years of patent accumulation have created a moat for us to achieve mass production of EUV lithography machines.
And we also noticed that in recent years, the Chinese Academy of Sciences has begun to recruit EUV talents both inside and outside the institute and even internationally.
This seems to indicate that our EUV lithography machine has begun to move from the laboratory stage to the factory stage, and from the theoretical stage to the practical stage.
In short, we can see that the Chinese Academy of Sciences has great advantages in EUV patents, and the remaining work is mainly to turn our theory into reality, because we can start to look forward to it, which is why the "gate" of EUV lithography machine is being Open to Chinese enterprises.
I had been noticing a big increase in patent activity around EUV subsystems and EUV tooling from Chinese institutes, it could be an indication that the are ready to do next step which is the commercialization and the creation of shell companies for EUV related technologies, still a long road before a commercially viable scanner but a big step nevertheless, so looks like i am not the only one sharing that sentiment.
Obviously, years of patent accumulation have created a moat for us to achieve mass production of EUV lithography machines.
And we also noticed that in recent years, the Chinese Academy of Sciences has begun to recruit EUV talents both inside and outside the institute and even internationally.
This seems to indicate that our EUV lithography machine has begun to move from the laboratory stage to the factory stage, and from the theoretical stage to the practical stage.
In short, we can see that the Chinese Academy of Sciences has great advantages in EUV patents, and the remaining work is mainly to turn our theory into reality, because we can start to look forward to it, which is why the "gate" of EUV lithography machine is being Open to Chinese enterprises.
I had been noticing a big increase in patent activity around EUV subsystems and EUV tooling from Chinese institutes, it could be an indication that the are ready to do next step which is the commercialization and the creation of shell companies for EUV related technologies, still a long road before a commercially viable scanner but a big step nevertheless, so looks like i am not the only one sharing that sentiment.
Is there a news article that mentions this? I haven't seen anything...
Hua Hong to raise CNY18 billion from STAR listing
China-based foundry Hua Hong Semiconductor is heading toward its share listing on the Science and Technology Innovation Board (STAR Market) of the Shanghai Stock Exchange (SSE), looking to raise CNY18 billion (US$2.66 billion) for specialty process
Even then all depends on phrasing, if it says "equipment exclusive for below 14nm process" or if it says "equipment that could be use for 14nm process", if is the first then all this ban is more symbolic than substantive because very few equipment is used exclusive for below 14nm process. But if is the second then is a wider ban and subject to each party interpretation. But looks like there is nothing that could stop fabs to repurpose their "28nm" equipment to 14nm process in the near future.
Either way looks like Chinese semi equipment makers are going to get even more sales in the near future.
There's another phrasing. In the Bloomberg article from last month they quoted the Lam CEO as saying:
“We were recently notified that there was to be a broadening of the restrictions of technology shipments to China for fabs that are operating below 14 nanometers”
If this is the language they actually used then it sounds more like entirely cutting off all fabs that have an active node below 14nm.
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