SMEE's Picometer-level grating patent is exposed! Exposure equipment for processes below 5nm
The patent exposed this time is used to manufacture gratings with an accuracy of picometers (less than 1 nanometer), which means that China has broken through the ultra-high-precision grating technology required by EUV lithography machines, and this equipment can be used for Exposure equipment for 5nm and more advanced process technology.
The patent exposed this time is used to manufacture gratings with an accuracy of picometers (less than 1 nanometer), which means that China has broken through the ultra-high-precision grating technology required by EUV lithography machines, and this equipment can be used for Exposure equipment for 5nm and more advanced process technology.