Chinese semiconductor industry

PopularScience said:

I see 2020 June 22. Which page is 2022 June 22?

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The link is for IPO filing from 2020.

I tried to upload the June 22, 2022 file, but it was too big & I didn't look for it online. The one from last month was a response to inquiries (审核问询函的回复).

tokenanalyst said:

that from early 2021, they don't called DWSi in the 2022 fillings that in the last ones the refer to "immersion stage".

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You are correct, they stopped using DWS or DWSi starting their Sept 2021 filing. But this latest one is a response to inquiries. Specific questions were raised based on their prior filing. Question asked, and UPrecision answered. The format of these 'responses' is all muddled and hard to read, especially when I have to rely on translations when I can't understand the audio.

I didn't doctor the image clip. They really did use DWS and DWSi in their response.

tokenanalyst said:

in their filling from december 2021 they called the research of such project "complete"

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This is in context of development of the 'six degree' magnetic levitation stage 'technology'. The completion of this is probably related to them getting paid by SMEE. But this is used in the dry DWS stages. So, I don't see a conflict with their June 2022 filing. In all of their filings, drafts, and responses, they repeatedly states DWS stage as completed and DWSi as in development or in later filings, dry stage delivered and immersion stage are in development.

There are like over 10 different documents. For the June 2022 responses, there are like 4 or 5 filings, one for specific questions, I think.

In the 2022 IPO filling all the relevant patents of "immersion project" where transferred for a fee from Tsinghua to U-Precision this year, delays in delivering may had happened or will happen but the R&D for the "immersion project" looks like is done.

hvpc said:

This is in context of development of the 'six degree' magnetic levitation stage 'technology'. The completion of this is probably related to them getting paid by SMEE. But this is used in the dry DWS stages.

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They have been delivering dry stages since 2020, in fact the first one was delivered in 2017 which was accepted by SMEE. This is about the research and development of the "immersion stage", was over in December 2021.
I doesn't said anything about getting paid, it says "research complete, ready for practical application", the dry stage is suppose to have a precision of less than 4nm and the immersion stage was suppose to be less than 2nm, so this is probably more related to the immersion stage.

hvpc said:

@dropout003,
And this is latest filing (审核问询函的回复) on June 22, 2022, response from UPrecision to inquiries on their prior IPO filings.

So just last month, part of their response to question on technical risks of UPrecision Dual stage for immersion & EUV:

"The company launched the DWS nano-precision motion and measurement and control system according to the needs of the market. The DWS series nanometer precision motion and measurement and control systems are mainly suitable for dry stepping scanning lithography machines (ArF, KrF and i-line lithography machines).​

To sum up, the company's DWS series nanoprecision motion and measurement and control system products (for I-line, KrF and ArF dry lithography machines) have been developed and shipped; DWSi series nano-precision motion and measurement and control system products (for ArFi immersion Photolithography machine) is in the process of research and development, and the research and development of technology and products conforms to the development trend of technology."​

View attachment 93889

sorry, I tried to upload the file but file size too big. so screenshot is best I could do.

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I found the link to file 8-1-1:


There are more responses from June 22, 2022........8-1-2, 8-1-3, 8-1-4, & 8-1-5,. The last file is just some declaration that filing is legit; didn't bother translating it so don't know exactly what 8-1-5 is. You can look for these and download them to view since files too big for me to upload here for all to read.

hvpc said:

I found the link to file 8-1-1:

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There are more responses from June 22, 2022........8-1-2, 8-1-3, 8-1-4, & 8-1-5,. The last file is just some declaration that filing is legit; didn't bother translating it so don't know exactly what 8-1-5 is. You can look for these and download them to view since files too big for me to upload here for all to read.

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That is from December 2021 and that is that one that says in the table the research was done. I found more recent one but didn't save it and can't find it.

tokenanalyst said:

In the 2022 IPO filling all the relevant patents of "immersion project" where transferred for a fee from Tsinghua to U-Precision this year, delays in delivering may had happened or will happen but the R&D for the "immersion project" looks like is done.

I doesn't said anything about getting paid, it says "research complete, ready for practical application", the dry stage is suppose to have a precision of less than 4nm and the immersion stage was suppose to be less than 2nm, so this is probably more related to the immersion stage.

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Well, you have to look at all the filing in context. Look at the disclosure on when and why they were paid. In one of the filing they talked about SMEE signing off on hitting development milestone so they were paid. And they specifically state how much they were paid for development and what is for actual state delivered.

I would not be surprise if what you listed is for finishing a milestone for the immersion stage. Since in the latest response filing they said the immersion stage is in development but the development is 'keeping pace' with technology. I take this to mean that the development progress is on track and and good progress.

FairAndUnbiased said:

Wonder if SMEE can take a different direction simultaneously: low end super low cost.

I was reading on EVG's UV LED lithography source for substituting mercury i-line. Turns out many companies are doing this now.

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There's papers demonstrating UV LED lithography devices built by individuals or research groups of a few people (!).

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One advantage is that unlike a mercury lamp, UV LEDs have nanosecond turn on times and thus can be throttled with PWM instead of using a blocker. They also don't require lamp change due to very long lifetimes.

I hope SMEE can keep lowering costs for packaging and older nodes lithography using new tech to fully cabbagize older node semiconductor and squeeze revenue at the bottom.

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They have been considering using UV-LED for while, i think they have develop systems to accommodate such light source.


Something that I feared for some time, Is that there a some Chinese companies entering maskless space right now, either in projection maskless lithography (DMD and SLM) and multibeam laser maskless lithography. In a perfect world without export controls were ASML continue to dominate the Chinese Frontend market unchecked, SMEE products for could find themselves sandwiched between the maskless market as this systems throughput and resolution increase in the next 10 years, unable to compete in power, packaging or even FPD and unable to compete with ASML high end scanners.

tonyget said:

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Let me remind you again, Sinodefence Forum is an English language forum. You may post in a any language, however provide an English translation or summary for any non-English post and any links posted.

tonyget said:

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话不多说，请看视频。, 视频播放量 135294、弹幕量 186、点赞数 9154、投硬币枚数 2875、收藏人数 1382、转发人数 555, 视频作者 一水遮夏, 作者简介...

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by78 said:

Let me remind you again, Sinodefence Forum is an English language forum. You may post in a any language, however provide an English translation or summary for any non-English post and any links posted.

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I took a quick crack at translating the video almost verbatim. I did rearrange the order of the info and highlighted key message in bold font. Buy it's basically a transcript of the video, not mine opinion.

I did not have the luxury of Google translator and solely relied on my rudimentary Chinese listening skill. If I made mistake translating, hope others would help point them out and make corrections.


The creator/author presented the video in 5 sections

=====================
1.

• UPrecision delivered 5 sets DWS dual stages to SMEE from April ’20 to Dec ’21.
  • Note: DWS is dual stage for dry litho tool & DWSi is for immersion tool.
• The host of video therefore assumed 3-5 assembled prototype (not production) litho systems at SMEE.
• News of: 1. UPrecision & SMEE collaboration on proto I, II, & III systems along & 2. Delivery of 5 DWS to SMEE provide evidence to support assumption of at least 3 systems undergoing verification.
• UPrecision revealed SMEE’s plan to ship litho system with DWS stages around end of 2022. Customers include Yangdong, YMTC, and CXMT. Uncertainties and risks with the plan remain a possibility.

2.

• UPrecision has 327M RMB back order of DWS stages.
• SMEE must have confidence in DWS stage otherwise would not issue such big order
• Each DWS is ~20M RMB (but this couldn’t be verified).
• So, SMEE may be planning 15-20 dry Lito tools in the near future

3. What can dry systems do?

• UPrecision indicate DWS can support needs of 65nm litho systems.
• Creator of video believes it may be possible to improve beyond 65nm capability, but these are not the rumored 28nm node litho system

4. Why isn't it for immersion?

• Answer: Very simple, it (DWSi?) has not been (finished) developed yet.
• The 02 project target is an immersion litho tool, not dry tool.
• So, in another word, UPrecision has not realized its 02 project commitment yet.

5 What is the status of immersion development?

• Two Immersion hood has already been developed by Cheer and delivered to SMEE.
• But the immersion dual stage that goes hand-in-hand with the immersion hood is still in development.
• Status of immersion dual stage development:
  • UPrecision had built 20 development prototype systems & 85 test units as of December 2021.
  • It is unclear if the 20 development prototype system refers to actual dual stages or modules. Combining with news of only 2 immersion hood, creator of video hypothesize it’s 20 module. Because having 20 immersion stage to go with 2 immersionhood just isn’t logical.
• UPrecision development cost is high in 2019 & 2020 then drastically reduced in 2021. Author thinks this is sign that major milestone had been over taken so the development cost decreased drastically.
• Filing for 02 project subsidy is based on projected expenses and raw material cost. Same trend of reduced subsidy filing observed in 2021. This is another clue suggesting development of immersion dual stages has entered mid-testing(?) phase.

6.Any concerns?

• Yes. The dual stages interferometer supply source is Zygo, an American company. There is risk of supply being cut off. As there's no alternate domestic option, this is currently the biggest risk.

So, the good news: The (litho system) has finally reached volume production. The bad news: it's not THE (28nm) tool that everyone was hoping for. But, the first step has been taken so the next step will not be far away.

--- end of "transcript" ---

tokenanalyst said:

They have been considering using UV-LED for while, i think they have develop systems to accommodate such light source.
View attachment 93911

Something that I feared for some time, Is that there a some Chinese companies entering maskless space right now, either in projection maskless lithography (DMD and SLM) and multibeam laser maskless lithography. In a perfect world without export controls were ASML continue to dominate the Chinese Frontend market unchecked, SMEE products for could find themselves sandwiched between the maskless market as this systems throughput and resolution increase in the next 10 years, unable to compete in power, packaging or even FPD and unable to compete with ASML high end scanners.

View attachment 93912

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View attachment 93913

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@tokenanalyst , any idea how to read the WPH spec? 480WPH@300mm*@4wafers&300mJ/cm^2

Is this throughput based on specific use case like RDL layer with smaller total exposed area per wafer?

hvpc said:

@tokenanalyst , any idea how to read the WPH spec? 480WPH@300mm*@4wafers&300mJ/cm^2

Is this throughput based on specific use case like RDL layer with smaller total exposed area per wafer?

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Looks like it can pattern 4 wafers at a time with an x amount of UV-Dose so that will give an XXX amount of Wafers/Hour, higher the dose higher the output but lower the resolution.