The National Innovation Center (Suzhou) has launched a significant breakthrough in semiconductor engineering through its newly established Advanced Bonding Technology R&D Center, addressing critical challenges posed by the approaching physical limits of Moore's Law. As the industry shifts toward heterogeneous materials and three-dimensional integration for applications like power electronics, radio frequency communications, and AI chips, traditional high-temperature bonding processes often fail when dealing with wide-bandgap semiconductors such as Gallium Arsenide (GaN), Silicon Carbide (SiC), and emerging oxides like Ga₂O₃. The center focuses on room-temperature direct bonding technology, which enables atomic-level fusion of diverse materials without the need for extreme heat. This innovation overcomes bottlenecks related to interface thermal resistance and material compatibility, offering a transformative path forward for improving device performance, reliability, and thermal management under extreme operating conditions.
To achieve this vision, the center has systematically solved core scientific and engineering problems associated with direct bonding at room temperature. Key challenges such as surface treatment, ultra-high vacuum environment control, precise alignment accuracy, and the regulation of interface stress have been addressed to create a stable, replicable process system. The team successfully developed ultra-high vacuum bonding equipment capable of handling wafers ranging from 2 to 8 inches, reaching an international advanced level in terms of consistency, scalability, and material compatibility. These breakthroughs allow for the integration of diamond—a material renowned for its superior heat dissipation capabilities with mainstream semiconductor materials like silicon and Ga₂O₃, creating highly reliable heterogeneous structures that can withstand temperatures up to 1000°C while maintaining nanometer-level interface flatness.

The practical application of these technologies has already yielded verifiable performance improvements. For instance, the successful construction of a Ga₂O₃/diamond heterostructure demonstrated that the new bonding method reduces interface thermal resistance to less than one-twentieth of traditional substrate structures. This drastic reduction significantly suppresses surface temperature rise in devices, effectively breaking through previous limits on power and frequency performance. These achievements move the technology from proof-of-concept stages to engineering readiness, providing a robust solution for enhancing high-power devices, solving high-frequency failures in RF microwave systems, and supporting advanced packaging solutions that are essential for the next generation of computing and energy technologies.
Strategically, this initiative is designed to leverage multiple trillion-yuan-level industrial tracks, from restructuring upstream materials supply chains to empowering midstream fields like front-end radio frequencies and downstream emerging industries such as AI chips. By establishing an independent and controllable equipment and process system for atomic-scale manufacturing, the center aims to enhance China's self-controllability of its semiconductor industrial chain and seize a technological high ground in the post-Moore era. Aligned with Jiangsu Province's "15th Five-Year Plan," this R&D hub represents a leapfrog development path for compound semiconductors and advanced packaging, positioning Suzhou as a leading domestic and international innovation hub that drives the transformation of research results into core industrial capabilities.