i have been reading all these comments and this is my first response to EUV related discussion/integrated system and those Chinese experts remarks.
nothing new information in fact there are many mistakes in that article ''China should mobilized entire nation resource and create its own ASML'' that is already outdated.
1. nation resources have already mobilized at least since 2020 to effectively created Lithography supply chain and countless suppliers have emerged for critical components. China right now have a working machine and all thanks to these efforts.
2.
@tokenanalyst and i have stated many times, they are not only building scanner but creating entire ecosystem. like EUV photomask, EUV photoresists , inspection equipment , and
EUV AIMS is incredible complex metrology tool.
apart from this EUV system you also need Etching , deposition , ion implanter , other Metrology tools for high end logic chip. this is where NAURA/AMEC/Piotech comes into play. AMEC is all set to release 3nm etching tool. Shanghai based company Jingce Metrology tools verifying on 7nm. so Chinese SME companies rapidly building advance logic tools/equipment and by the time local EUV will be ready other non-Litho tools will be ready too for integration into manufacturing line.
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one example.
this is an extremely important Patent and directly related to EUV AIMS metrology tool i just mentioned above. this device designed by SIOMP institute which is also an integral player in local EUV scanner program.
View attachment 170939
as you see, these EUV players not only working on EUV scanner but on other critical tools as well which is important for scanner.
see the entire ecosystem is taking shape. but the main question is, which company will produce EUV scanner. so i guess we have to wait and see.