Chillers for Cryogenic Ultra High Aspect Ratio Etching.
Zhongleng Cryogenics independently developed the ZU35 cryogenic etch Chiller, primarily used for precise temperature control of process equipment in semiconductor (FAB) and FPD display manufacturing processes, such as temperature control of etching/thin film/coating/developing equipment (e.g., LAM, AMAT, TEL, NAURA, Naura, Aixtron, Veeco, AMEC, etc.). The cryogenic etch Chiller mainly consists of a liquid pump, heat exchanger, liquid receiver, refrigeration compressor, and control system for temperature control during the process.
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Key technical specifications: The ZU35 temperature controller can achieve a wide temperature range of -80°C to +40°C and maintain an extremely high temperature accuracy of ±0.1°C, which provides a stable low-temperature environment for the low-temperature etching processes of equipment manufacturers such as Lam Research and Tokyo Electron (TEL).
Key application scenarios: It is mainly used in the semiconductor and display panel manufacturing process to provide precise temperature control for core process equipment such as etching, thin film deposition, coating and developing, and is a key infrastructure to ensure production yield and equipment performance.
Technical advantages: By adopting advanced fuzzy control, energy-saving frequency conversion and ultra-low temperature refrigeration technology, it is not only accurate and reliable in temperature control, but also significantly reduces equipment energy consumption, which is in line with the development trend of green manufacturing in the semiconductor industry.
These advanced basic process equipment together form the cornerstone of advanced semiconductor manufacturing capabilities, driving the continuous evolution from 3D NAND to the entire computing ecosystem.