ACM Research Shanghai is expanding their semiconductor equipment layout in 2024.
Shengmei Shanghai continues to optimize and refine existing equipment, and enriches product categories through extension development. In addition to cleaning equipment, AMC Shanghai is also actively expanding its product portfolio in semiconductor electroplating equipment, semiconductor copper polishing equipment, advanced packaging wet-process equipment, vertical furnace tube equipment, front-end coating and development (Track) equipment, and plasma enhanced chemistry. Expand layout in fields such as vapor deposition (PECVD) equipment.
In the field of semiconductor electroplating equipment, Shengmei Shanghai independently developed Ultra ECP map, an IC front-end copper interconnect copper plating technology targeting the 28nm technology node.
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In terms of advanced packaging wet-process equipment, AMC Shanghai currently has the most complete range of advanced packaging wet-process equipment lines in the world, such as cleaning, wet etching, glue coating, development, degumming, electroplating and polishing equipment (such as electropolishing) ), etc. have been used in many large client production lines.
In the field of vertical furnace tube equipment, the products developed by Shengmei Shanghai mainly include low-pressure chemical vapor deposition furnaces, oxidation annealing furnaces, alloy furnaces and atomic layer deposition furnaces. It is understood that in 2023, Shengmei Shanghai will further develop plasma atomic layer deposition technology based on the Ultra Fn vertical furnace equipment platform, combined with the previously launched differentiated thermal atomic layer deposition furnace technology (Ultra FnA) with independent intellectual property rights. Deposition vertical furnace Ultra FnA. This ALD furnace tube technology provides better step coverage and shortens ALD cycle times to increase equipment output.
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Shengmei Shanghai expects vertical furnace tube equipment to contribute significantly to revenue in 2024. In addition,
ACM Shanghai is accelerating the verification of Track and PECVD equipment and the development of new customers. It is expected that Track equipment and PECVD equipment will begin to contribute revenue in large quantities by 2025.
In the field of front-end glue coating and development (Track) equipment, its front-end glue coating and development Ultra Lith TM Track equipment is an equipment used in the 300 mm high-output front-end integrated circuit manufacturing process.
In the field of plasma enhanced chemical vapor deposition (PECVD) equipment, its Ultra Pmax TM PECVD equipment is equipped with differentiated cavity layout, gas distribution device and chuck design with independent intellectual property rights, which can provide better film uniformity and more optimized Film stress and less grainy properties.
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