Chinese semiconductor thread II

tokenanalyst

Lieutenant General
Registered Member

China's first EUV photoresist standard project was launched.​


According to the website of the Standards Administration of China, China's first EUV photoresist standard, "Extreme Ultraviolet (EUV) Photoresist Test Method," is being published as a proposed project standard starting October 23rd, with a deadline of November 22nd. The drafting organizations of the standard include Shanghai University, Zhangjiang National Laboratory, Shanghai Huali Integrated Circuit Manufacturing Co., Ltd., and Shanghai Microelectronics Equipment (Group) Co., Ltd.

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SanWenYu

Captain
Registered Member

China's first EUV photoresist standard project was launched.​


According to the website of the Standards Administration of China, China's first EUV photoresist standard, "Extreme Ultraviolet (EUV) Photoresist Test Method," is being published as a proposed project standard starting October 23rd, with a deadline of November 22nd. The drafting organizations of the standard include Shanghai University, Zhangjiang National Laboratory, Shanghai Huali Integrated Circuit Manufacturing Co., Ltd., and Shanghai Microelectronics Equipment (Group) Co., Ltd.

View attachment 163456
The US BIS: "Don't panic. It has to be for ASML's EUV machines. We all know Chinese cannot invent. We should crack down harder on the smuggling! The Dutches are useless. We need to take ASML from them."
 

jx191

New Member
Registered Member

China's first EUV photoresist standard project was launched.​


According to the website of the Standards Administration of China, China's first EUV photoresist standard, "Extreme Ultraviolet (EUV) Photoresist Test Method," is being published as a proposed project standard starting October 23rd, with a deadline of November 22nd. The drafting organizations of the standard include Shanghai University, Zhangjiang National Laboratory, Shanghai Huali Integrated Circuit Manufacturing Co., Ltd., and Shanghai Microelectronics Equipment (Group) Co., Ltd.

View attachment 163456
It's always interesting when official bodies talk about EUV and it's components. Rarely happens and a lot of the time goes under the radar/requires reading between the lines.

We've heard about photoresist development in the past, but if there are testing standards being proposed, what does that tell us about EUV situation?
 

SanWenYu

Captain
Registered Member
It's always interesting when official bodies talk about EUV and it's components. Rarely happens and a lot of the time goes under the radar/requires reading between the lines.

We've heard about photoresist development in the past, but if there are testing standards being proposed, what does that tell us about EUV situation?
Yet another, and the most official one so far, indirect evidence that China has domestic EUV machines and the full lines of ancillary equipments in final stages of development. Or where could the Chinese have done the work of developing this industry standard on EUV photoresist?
 

tokenanalyst

Lieutenant General
Registered Member
We've heard about photoresist development in the past, but if there are testing standards being proposed, what does that tell us about EUV situation?
They want everyone developing EUV resist dancing to the same EUV song so will be easier for fabs to select suppliers.
 
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