China's first EUV photoresist standard project was launched.
According to the website of the Standards Administration of China, China's first EUV photoresist standard, "Extreme Ultraviolet (EUV) Photoresist Test Method," is being published as a proposed project standard starting October 23rd, with a deadline of November 22nd. The drafting organizations of the standard include Shanghai University, Zhangjiang National Laboratory, Shanghai Huali Integrated Circuit Manufacturing Co., Ltd., and Shanghai Microelectronics Equipment (Group) Co., Ltd.