Chinese semiconductor thread II

[snake070]

“国家质量基础设施体系”重点专项 2022 年度项目申报指南

3.1 高端装备与先进制造领域NQI协同创新面向光刻机的高速超精密动态校准技术研究与应用

需求目标：针对国产光刻机整机集成时和在役工作时工作精度、性能与稳定性无法保证，亟待解决高速超精密激光干涉测量 系统动态校准和在役校准的“卡脖子”难题，研究甚多轴高速超精密激光干涉测量系统动态校准技术和在役校准技术，研制校准装置，关键技术自主可控，具有自主知识产权，具体需求目标如下：

（1）光刻机集成时的多轴高速超精密干涉测量系统动态校准 技术和装置，校准范围≥600mm，最大速度≥2m/s，不确定度 ≤1nm+2×10-9L（k=2），L为位移值。

（2）嵌入光刻机的20轴以上高速超精密激光干涉仪系统的 在役校准技术和装置，激光波长校准的相对不确定度优于6×10-10 （k=2），分辨力≤0.2nm，不确定度≤2nm+3×10-9L（k=2），L为 位移值。

（3）制定光刻机用高速超精密激光干涉仪校准规范2项，在 国家最高计量技术机构建标，形成面向光刻机产业的有效国家测 量体系，并与国际权威计量机构进行国际比对。

（4）在国产先进光刻机研制生产单位中国电子科技集团和上 海微电子装备有限公司开展应用验收，4年内可满足国产28nm光刻机高速超精密激光干涉仪校准需求。 （5）项目完成时通过准确性和稳定性测试，并取得用户测试验收报告，平均故障间隔时间≥3000小时，技术就绪度≥8级。

时间节点：研发时限为4年，立项24个月后开展“里程碑”考核。

(4) Conduct application acceptance testing at CETC and SMEE, the domestic manufacturers of advanced lithography machines. Within four years, the system will meet the calibration requirements for high-speed, ultra-precision laser interferometers used in domestic 28nm lithography machines.
(5) Upon project completion, pass accuracy and stability tests and obtain user acceptance reports. Achieve a mean time between failures (MTBF) ≥ 3000 hours and a Technology Readiness Level (TRL) ≥ 8.

Timeline: The R&D period is 4 years, with a milestone assessment conducted 24 months after project initiation.

 

[jx191]

Do we have any production microchip using china's domestic lithography machine in 28nm?

So far I have only seen rumours of testing but no production execution.

Same thing with EUV. I think we are being overly optimistic. I think China will not be able to get EUV and make actual production chip in the next 5 years when they are so far behind in DUV lithography.

You dont need to achieve DUV in order to achieve EUV.

They are two separate technologies.

 

[snake070]

ZETOP Technologies Co

EUV Lithography Exposure System
Each finished unit weighs approximately 1.5 tons, with dimensions of about 1.5m × 1.8m × 1.6m. The R&D cycle for a single system spans approximately 3 to 5 years.

 

[jx191]

ZETOP Technologies CoView attachment 160977

EUV Lithography Exposure System
Each finished unit weighs approximately 1.5 tons, with dimensions of about 1.5m × 1.8m × 1.6m. The R&D cycle for a single system spans approximately 3 to 5 years.

All the stuff you are posting shows that development happens behind the curtains for the most part with little to no live coverage of the projects undertaken. If everyone had access to this with ease, there wouldn't be as much speculative discussions about the situation on the ground.

 

[snake070]

您发布的所有内容都表明，开发大部分发生在幕后，几乎没有对所承担项目的现场报道。如果每个人都能轻松接触到这一点，就不会有那么多关于当地局势的猜测性讨论。

The timeline for DUV lithography machines is 2025, while EUV lithography machines are scheduled for 2027 to 2030. This is the national plan, and I'm unsure if there will be any acceleration.
The national medium-to-long-term plan includes a roadmap, with EUV lithography machines slated for realization by 2030.
Moreover, due to the current tensions between China and the United States, all projects are subject to extremely high levels of secrecy. Simply knowing the timelines is already quite challenging.

 

[jx191]

View attachment 160978
The timeline for DUV lithography machines is 2025, while EUV lithography machines are scheduled for 2027 to 2030. This is the national plan, and I'm unsure if there will be any acceleration.
The national medium-to-long-term plan includes a roadmap, with EUV lithography machines slated for realization by 2030.
Moreover, due to the current tensions between China and the United States, all projects are subject to extremely high levels of secrecy. Simply knowing the timelines is already quite challenging.

Thanks for this. The users who have to translate their posts from English into Chinese always seems like they end up having some really good information to share!

 

[sunnymaxi]

Thanks for this. The users who have to translate their posts from English into Chinese always seems like they end up having some really good information to share!

now you happy.. lol

that nativechicken guy also told the same date. low rate initial production by 2027.

 

[snake070]

Thanks for this. The users who have to translate their posts from English into Chinese always seems like they end up having some really good information to share!

The construction plan for ZETOP is documented in a detailed Word file. I contacted the Changchun government for consultation (with call recordings available for verification). They provided me with the detailed document only after I assured them I would not disclose confidential information. The screenshot above shows only the publicly available portion; I will not release any confidential sections.

 

[sunnymaxi]

The construction plan for ZETOP is documented in a detailed Word file. I contacted the Changchun government for consultation (with call recordings available for verification). They provided me with the detailed document only after I assured them I would not disclose confidential information. The screenshot above shows only the publicly available portion; I will not release any confidential sections.

i was about to say this.. don't disclose any sensitive information. thanks

 

[jx191]

now you happy.. lol

that nativechicken guy also told the same date. low rate initial production by 2027.

Its not particularly surprising when you consider the amount of research papers that China has produced recently. The information is there, just requires a bit of digging.