English translation of Oldschool's post on Naura ALD:
Polaris PE series PEALD equipment is a flexible and reliable plasma-enhanced atomic layer deposition process platform designed for scientific research, enterprise R&D and large-scale automated production. This equipment is very suitable for scaling up from thin film deposition in the research and development stage to large-scale industrial production. Different from ordinary CVD or PECVD principles, PEALD can deposit ultra-thin, high aspect ratio films. The Polaris PE series of PEALD equipment uses radio frequency to add precursors to the vacuum chamber step by step during the process cycle to achieve precise control of the film thickness. It can be used to deposit SiO2, SiNx, TiN, ALN and other thin films . Polaris PE series PEALD equipment can provide enough active sources through high-efficiency CCP plasma, and at the same time, reduce the damage of free ions to the substrate film. The unique gas path, cavity structure design, and corresponding process recipes have successfully achieved different The deposition thickness of the thin film is controllable; this equipment can be upgraded with more precursor sources and gas paths, high vacuum pumps, in-situ cleaning and other options; the specially designed intake structure solves the particle problem of the traditional chamber and makes it have Good cleanliness improves the electrical performance and yield of the product; the equipment system is easy to install and maintain, which greatly improves the cycle of installation and PM.