Founded in September 2018, Yuanlei Nano was established by a professional team with nearly 20 years of experience in semiconductor equipment and process R&D. It is committed to becoming a high-end semiconductor equipment supplier with core technologies in equipment, materials, processes, and components. The company focuses on the customization, R&D, production, and sales of advanced semiconductor coating equipment. With its leading thin-film equipment design concepts and strong process and material capabilities, it has successively won honors such as High-tech Enterprise, Nanjing Unicorn Enterprise Cultivation, and Jiangsu Province Specialized and Innovative Small and Medium-sized Enterprise. Its entire product line benchmarks against major overseas manufacturers, leading the domestic market.
As an innovator in the semiconductor equipment field, Yuanlei Nano is committed to building a high-end national brand of purely domestically produced semiconductor equipment through independent innovation and vertical integration of the industrial chain. The company's products mainly cover atomic layer deposition (ALD) equipment and
silicon-germanium epitaxy (EPI) equipment, which can be widely used in 2.5D/3D advanced packaging, compound semiconductors, and advanced logic memory processes below 28nm, providing high-performance and high-stability equipment solutions to global customers.
Epic CM R
Equipment Introduction: 8/12-inch Low-Temperature Selective Silicon-Germanium Epitaxy Equipment
Application areas: Advanced logic, memory, and power devices below 28 nanometers.
TiNATM Series
Equipment Description: 12-inch multi-chamber atomic layer deposition (ALD) system based on infrared heating
Application areas: Advanced logic, memory, and power devices below 28 nanometers.
Compounds ALD Flura PC-10
Equipment Introduction: 8-inch cluster atomic layer deposition equipment (monthly capacity up to 5000 wafers)
Application areas: Compound semiconductor field
Elegant Ⅱ YE-200/300HL
Equipment type: 8/12-inch atomic layer deposition/atomic layer etching equipment (with in-situ integrated measurement capabilities)
Application areas: Universities, research institutes, etc. that require in-situ testing of atomic layer deposition (e.g., XPS, ellipsometer testing).