can't believe they're hurting Africa's nascent EUV market by flooding it with cheap EUV machines.Hope they won't flood the market with a variety of cheap EUV light sources. Lol
oh the tragedy.
-Probably a western news outlet in like 2040
can't believe they're hurting Africa's nascent EUV market by flooding it with cheap EUV machines.Hope they won't flood the market with a variety of cheap EUV light sources. Lol
How do you know Fab 3 is running 100% domestic equipment and not in fab 2? How do you know it's going to add 100 to 135k wpm in next 18 months?yes. its Fab 3 that running on 100% domestic equipment and they are going to expand it further. YMTC going to add 100k to 135k WPM in next 18 months.
so for something that seems like quite relevant here, do you mind posting a link of where this translation comes from?
Harbin Founded Suzhou Extreme Ultraviolet Semiconductor Co., Ltd is making progress on Commercial EUV Light Sources.
Suzhou Extreme Ultraviolet Semiconductor Co., Ltd. has successfully developed a 120W extreme ultraviolet (EUV) light source prototype — a critical breakthrough in China’s quest to overcome the long-standing technological bottleneck in EUV lithography equipment. As EUV lithography is essential for manufacturing advanced chips, global supply restrictions have made domestic EUV light source development a national strategic priority. Founded in 2022, the company, led by plasma expert Professor Zhang Xingqiang, has achieved key milestones including successful discharge tests and filed core patents for innovations like the “dual vacuum light source design” and “capillary discharge plasma-coupled structure,” which enhance output power and purity while reducing operational complexity.
With a 120W output meeting baseline EUV lithography requirements, the company aims to supply domestic chipmakers like SMIC and Shanghai Microelectronics, offering solutions 15–30% cheaper than global leaders ASML and Nikon, while maintaining strong margins. Targeting commercialization by 2026 and mass production by 2030, Suzhou EUV is now seeking financing to refine its prototype and accelerate industrialization. The breakthrough represents not just a technological leap but a pivotal step toward China’s semiconductor self-reliance, with plans to list on the STAR Market. This achievement signals major progress in decoupling China’s chip industry from foreign dependencies.
View attachment 168902
Is quite an advancement but they still have work to do. probably a few years more.How do you know Fab 3 is running 100% domestic equipment and not in fab 2? How do you know it's going to add 100 to 135k wpm in next 18 months?
so for something that seems like quite relevant here, do you mind posting a link of where this translation comes from?



So now we have confirmed EUV light source teams working on DPP, LPP, SSMB, FEL and HHG with varying degrees of progress. Within LPP, we also have at least three teams working on three drive laser types: CO2 laser (most mature tech SiCarrier), 1 micron solid state laser and 2 micron solid state laser (SIOM).
Harbin Founded Suzhou Extreme Ultraviolet Semiconductor Co., Ltd is making progress on Commercial EUV Light Sources.
Suzhou Extreme Ultraviolet Semiconductor Co., Ltd. has successfully developed a 120W extreme ultraviolet (EUV) light source prototype — a critical breakthrough in China’s quest to overcome the long-standing technological bottleneck in EUV lithography equipment. As EUV lithography is essential for manufacturing advanced chips, global supply restrictions have made domestic EUV light source development a national strategic priority. Founded in 2022, the company, led by plasma expert Professor Zhang Xingqiang, has achieved key milestones including successful discharge tests and filed core patents for innovations like the “dual vacuum light source design” and “capillary discharge plasma-coupled structure,” which enhance output power and purity while reducing operational complexity.
With a 120W output meeting baseline EUV lithography requirements, the company aims to supply domestic chipmakers like SMIC and Shanghai Microelectronics, offering solutions 15–30% cheaper than global leaders ASML and Nikon, while maintaining strong margins. Targeting commercialization by 2026 and mass production by 2030, Suzhou EUV is now seeking financing to refine its prototype and accelerate industrialization. The breakthrough represents not just a technological leap but a pivotal step toward China’s semiconductor self-reliance, with plans to list on the STAR Market. This achievement signals major progress in decoupling China’s chip industry from foreign dependencies.
View attachment 168902
中国科学院上海光学精密机械研究所林楠研究员团队成员,胡桢麟博士在本次论坛上发表报告,分享了团队在1微米固体激光驱动锡等离子体极紫外(EUV)光源领域的研究进展。
So now we have confirmed EUV light source teams working on DPP, LPP, SSMB, FEL and HHG with varying degrees of progress. Within LPP, we also have at least three teams working on three drive laser types: CO2 laser (most mature tech SiCarrier), 1 micron solid state laser and 2 micron solid state laser (SIOM).